EXPOSURE SYSTEM System Overview of Optical Steppers and Scanners; Michael S. Hibbs Optical Lithography Modeling; Chris A. Mack Optics for Photolithography; Bruce W. Smith Excimer Laser for Advanced Microlithography; Palash Das Alignment and Overlay; Gregg M. Gallatin Electron Beam Lithography System; Kazuaki Suzuki X-Ray Lithography; Takumi Ueno EUV Lithography; Stefan Wurm and Charles Gwyn Imprint Lithography; Douglas J. Resnick RESISTS AND PROCESSING Chemistry of Photoresist Materials; Takumi Ueno and Robert D. Allen Resist Processing; Bruce W. Smith Multilayer Resist Technology; Bruce W. Smith and Maureen Hanratty Dry Etching of Photoresists; Roderick R. Kunz METROLOGY AND NANOLITHOGRAPHY Critical-Dimensional Metrology for Integrated-Circuit Technology; Herschel M. Marchman, Gian Lorusso, Mike Adel, and Sanjay Yedur Electron Beam Nanolithography; Elizabeth A. Dobisz, Zvonimir Z. Bandic, and Martin C. Peckerar Index
Kazuaki Suzuki received his BS degree in plasma physics (1981), and his MS degree in X-Ray astronomy (1983) from Tokyo University. He retired from a doctorate course in X-ray astronomy joined the Nikon Corporation in 1984. He has participated in several projects of new concept exposure tools such as KrF excimer laser stepper, KrF excimer laser scanner, the electron-beam projection lithography tool and the full field EUV scanner. He has authored and coauthored many papers in the field of exposure tools and related technologies. He also holds numerous patents in these areas. Now he belongs to Research and Development Headquarters, Core Technology Center of Nikon Corporation.