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Fundamentals of Nanoscaled Field Effect Transistors Softcover reprint of the original 1st ed. 2013 [Pehme köide]

  • Formaat: Paperback / softback, 201 pages, kõrgus x laius: 235x155 mm, kaal: 3343 g, 102 Illustrations, color; 19 Illustrations, black and white, 1 Paperback / softback
  • Ilmumisaeg: 23-Aug-2016
  • Kirjastus: Springer-Verlag New York Inc.
  • ISBN-10: 1493944827
  • ISBN-13: 9781493944828
Teised raamatud teemal:
  • Pehme köide
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  • * hind on lõplik, st. muud allahindlused enam ei rakendu
  • Tavahind: 111,99 €
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  • Formaat: Paperback / softback, 201 pages, kõrgus x laius: 235x155 mm, kaal: 3343 g, 102 Illustrations, color; 19 Illustrations, black and white, 1 Paperback / softback
  • Ilmumisaeg: 23-Aug-2016
  • Kirjastus: Springer-Verlag New York Inc.
  • ISBN-10: 1493944827
  • ISBN-13: 9781493944828
Teised raamatud teemal:
This book covers principles and theory of nanoscale transistors, including quantum mechanical tunneling and inversion layer quantization and solutions like high-k and strained-Si technology, alternate structures and graphene technology. Includes case studies.

Fundamentals of Nanoscaled Field Effect Transistors gives comprehensive coverage of the fundamental physical principles and theory behind nanoscale transistors. The specific issues that arise for nanoscale MOSFETs, such as quantum mechanical tunneling and inversion layer quantization, are fully explored. The solutions to these issues, such as high-? technology, strained-Si technology, alternate devices structures and graphene technology are also given. Some case studies regarding the above issues and solution are also given in the book.

Scaling of a MOS Transistor.- Nanoscale Effects- Gate Oxide Leakage Currents.- Nanoscale Effects- Inversion Layer Quantization.- Dielectrics for Nanoelectronics.- Germanium Technology.- Biaxial s-Si Technology.- Uniaxial s-Si Technology.- Alternate MOS Structures.- Graphene Technology.