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xi | |
| Preface |
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xiii | |
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1 General Introduction to Transmission Electron Microscopy (TEM) |
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1 | (20) |
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1 | (2) |
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3 | (7) |
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7 | (1) |
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1.2.2 Inelastic Scattering |
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8 | (2) |
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1.3 Signals which could be Collected |
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10 | (2) |
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12 | (2) |
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12 | (1) |
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13 | (1) |
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1.5 Requirements of a Specimen |
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14 | (3) |
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17 | (1) |
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1.7 Two Dimensional and Three Dimensional Information |
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17 | (4) |
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2 Introduction to Electron Optics |
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21 | (18) |
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2.1 Revision of Microscopy with Visible Light and Electrons |
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21 | (1) |
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2.2 Fresnel and Fraunhofer Diffraction |
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22 | (1) |
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23 | (2) |
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25 | (5) |
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2.4.1 Electron Trajectories |
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26 | (1) |
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27 | (3) |
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30 | (2) |
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2.6 Probe Forming Optics and Apertures |
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32 | (1) |
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33 | (6) |
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39 | (16) |
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3.1 Introduction: Structural and Analytical Information in Electron Microscopy |
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39 | (2) |
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3.2 The Crewe Revolution: How STEM Solves the Information Problem |
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41 | (1) |
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3.3 Electron Optical Simplicity of STEM |
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42 | (3) |
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3.4 The Signal Freedom of STEM |
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45 | (3) |
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3.4.1 Bright-Field Detector (Phase Contrast, Diffraction Contrast) |
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45 | (1) |
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45 | (1) |
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46 | (1) |
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47 | (1) |
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47 | (1) |
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48 | (1) |
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3.5 Beam Damage and Beam Writing |
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48 | (1) |
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3.6 Correction of Spherical Aberration |
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49 | (2) |
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3.7 What does the Future Hold? |
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51 | (4) |
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4 Lens Aberrations: Diagnosis and Correction |
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55 | (34) |
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55 | (4) |
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4.2 Geometric Lens Aberrations and Their Classification |
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59 | (7) |
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4.3 Spherical Aberration-Correctors |
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66 | (8) |
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4.3.1 Quadrupole-Octupole Corrector |
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69 | (1) |
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70 | (2) |
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4.3.3 Parasitic Aberrations |
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72 | (2) |
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4.4 Getting Around Chromatic Aberrations |
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74 | (1) |
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4.5 Diagnosing Lens Aberrations |
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75 | (10) |
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4.5.1 Image-based Methods |
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77 | (3) |
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4.5.2 Ronchigram-based Methods |
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80 | (5) |
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85 | (1) |
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4.6 Fifth Order Aberration-Correction |
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85 | (1) |
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86 | (3) |
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5 Theory and Simulations of STEM Imaging |
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89 | (22) |
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89 | (1) |
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5.2 Z-Contrast Imaging of Single Atoms |
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90 | (2) |
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5.3 STEM Imaging Of Crystalline Materials |
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92 | (9) |
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5.3.1 Bright-field Imaging and Phase Contrast |
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93 | (3) |
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5.3.2 Annular Dark-field Imaging |
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96 | (5) |
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5.4 Incoherent Imaging with Dynamical Scattering |
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101 | (2) |
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5.5 Thermal Diffuse Scattering |
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103 | (3) |
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5.5.1 Approximations for Phonon Scattering |
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104 | (2) |
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5.6 Methods of Simulation for ADF Imaging |
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106 | (2) |
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5.6.1 Absorptive Potentials |
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106 | (1) |
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5.6.2 Frozen Phonon Approach |
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107 | (1) |
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108 | (3) |
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111 | (52) |
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6.1 Signal to Noise Ratio and Some of its Implications |
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112 | (1) |
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6.2 The Relationships Between Probe Size, Probe Current and Probe Angle |
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113 | (11) |
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6.2.1 The Geometric Model Revisited |
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113 | (2) |
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6.2.2 The Minimum Probe Size, the Optimum Angle and the Probe Current |
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115 | (1) |
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115 | (2) |
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6.2.4 A Simple Approximation to Wave Optical Probe Size |
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117 | (1) |
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6.2.5 The Effect of Chromatic Aberration |
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117 | (1) |
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6.2.6 Choosing αopt in Practice |
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118 | (1) |
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6.2.7 The Effect of Making a Small Error in the Choice of αopt |
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119 | (1) |
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6.2.8 The Effect of α On the Diffraction Pattern |
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120 | (2) |
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6.2.9 Probe Spreading and Depth of Field |
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122 | (2) |
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124 | (2) |
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126 | (7) |
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6.4.1 Principles of the Scanning System |
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126 | (2) |
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6.4.2 Implementation of the Scanning System |
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128 | (1) |
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6.4.3 Deviations of the Scanning System From Ideality |
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128 | (2) |
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6.4.4 The Relationship Between Pixel Size and Probe Size |
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130 | (1) |
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6.4.5 Drift, Drift Correction and Smart Acquisition |
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131 | (2) |
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133 | (2) |
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135 | (1) |
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136 | (1) |
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137 | (8) |
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6.8.1 Basic Properties of a Detector |
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137 | (2) |
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6.8.2 Single and Array Detectors |
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139 | (1) |
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6.8.3 Scintillator/Photomultiplier Detector |
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139 | (2) |
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6.8.4 Semiconductor Detectors |
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141 | (1) |
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142 | (3) |
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6.9 Imaging Using Transmitted Electrons |
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145 | (9) |
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6.9.1 The Diffraction Pattern |
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145 | (2) |
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6.9.2 Coherent Effects in the Diffraction Pattern |
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147 | (5) |
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6.9.3 Small Angular Range - Bright Field and Tilted Dark Field Images |
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152 | (1) |
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6.9.4 Medium Angular Range - MAADF |
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152 | (1) |
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6.9.5 High Angular Range - HAADF |
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153 | (1) |
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6.9.6 Configured Detectors |
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153 | (1) |
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154 | (9) |
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159 | (4) |
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7 Electron Energy Loss Spectrometry and Energy Dispersive X-ray Analysis |
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163 | (48) |
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7.1 What is EELS and EDX? |
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164 | (6) |
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164 | (2) |
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166 | (2) |
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7.1.3 Common Features For Analytical Spectrometries |
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168 | (2) |
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7.2 Analytical Spectrometries in the Environment of the Electron Microscope |
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170 | (12) |
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7.2.1 Instrumentation for EDX |
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170 | (4) |
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7.2.2 EELS Instrumentation |
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174 | (4) |
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7.2.3 Microscope Instrumentation for Analytical Spectroscopies |
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178 | (4) |
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7.3 Elemental Analysis and Quantification Using EDX |
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182 | (5) |
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7.4 Low Loss EELS - Plasmons, IB Transitions and Band Gaps |
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187 | (4) |
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191 | (10) |
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7.5.1 Elemental Quantification |
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191 | (4) |
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7.5.2 Near-Edge Fine Structure For Chemical and Bonding Analysis |
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195 | (5) |
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7.5.3 Extended-Edge Fine Structure For Bonding Analysis |
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200 | (1) |
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7.6 EDX and EELS Spectral Modelling |
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201 | (1) |
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7.6.1 Total Spectrum Modelling |
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201 | (1) |
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7.6.2 EELS Modelling of Near Edge Structures and also the Low Loss |
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201 | (1) |
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7.7 Spectrum Imaging: EDX and EELS |
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202 | (4) |
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7.8 Ultimate Spatial Resolution of EELS |
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206 | (1) |
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207 | (4) |
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8 Applications of Aberration-Corrected Scanning Transmission Electron Microscopy |
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211 | (30) |
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211 | (1) |
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212 | (1) |
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213 | (23) |
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8.3.1 Imaging of Isolated Atoms |
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213 | (6) |
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219 | (1) |
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8.3.3 Interfaces and Extended Defects (2-D) |
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220 | (6) |
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8.3.4 Detailed Particle Structures (3-D) |
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226 | (4) |
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230 | (1) |
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8.3.6 Core-loss EELS and Atomic-scale Spectroscopic Imaging |
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231 | (5) |
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236 | (5) |
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9 Aberration-Corrected Imaging in CTEM |
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241 | (22) |
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241 | (2) |
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9.2 Optics and Instrumentation for Aberration-Corrected CTEM |
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243 | (1) |
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9.2.1 Aberration-Correctors |
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243 | (1) |
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9.2.2 Related Instrumental Developments |
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243 | (1) |
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244 | (9) |
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9.3.1 CTEM Image Formation |
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244 | (2) |
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9.3.2 The Wave Aberration Function |
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246 | (6) |
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252 | (1) |
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9.4 Corrected Imaging Conditions |
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253 | (3) |
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9.4.1 The Use of Negative Spherical Aberration |
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254 | (2) |
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9.4.2 Amplitude Contrast Imaging |
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256 | (1) |
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9.5 Aberration Measurement |
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256 | (2) |
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9.5.1 Aberration Measurement From Image Shifts |
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256 | (1) |
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9.5.2 Aberration Measurement from Diffractograms |
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257 | (1) |
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9.5.3 An Alternative Approach to Aberration Measurement |
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258 | (1) |
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9.6 Indirect Aberration Compensation |
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258 | (1) |
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9.7 Advantages of Aberration-Correction for CTEM |
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259 | (1) |
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259 | (4) |
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260 | (3) |
| Appendix A Aberration Notation |
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263 | (4) |
| Appendix B General Notation |
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267 | (8) |
| Index |
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275 | |