Muutke küpsiste eelistusi

E-raamat: In-situ Electron Microscopy - Applications in Physics, Chemistry and Materials Science: Applications in Physics, Chemistry and Materials Science [Wiley Online]

Edited by (Universitat Regensburg, Regensburg, Germany), Edited by (Montanuniversitat Leoben, Leoben, Austria), Edited by (University of Virginia, Charlottesville, USA)
  • Formaat: 402 pages
  • Ilmumisaeg: 26-Apr-2012
  • Kirjastus: Blackwell Verlag GmbH
  • ISBN-10: 3527652167
  • ISBN-13: 9783527652167
Teised raamatud teemal:
  • Wiley Online
  • Hind: 195,60 €*
  • * hind, mis tagab piiramatu üheaegsete kasutajate arvuga ligipääsu piiramatuks ajaks
In-situ Electron Microscopy - Applications in Physics, Chemistry and Materials Science: Applications in Physics, Chemistry and Materials ScienceSuurem pilt
  • Formaat: 402 pages
  • Ilmumisaeg: 26-Apr-2012
  • Kirjastus: Blackwell Verlag GmbH
  • ISBN-10: 3527652167
  • ISBN-13: 9783527652167
Teised raamatud teemal:
Wiley Online e-raamatudRohkem infot Wiley Online kohta
Raamatu kodulehekülg: https://onlinelibrary.wiley.com/doi/book/10.1002/9783527652167
Scientists and engineers from physics, chemistry, and materials science look at current possibilities for performing dynamic experiments inside the electron microscope, centering their attention on transmission electron microscopy, but also considering scanning electron microscopy. After setting out the basics and methods, they explain applications in watching growth and interactions and identifying mechanical and physical properties. Among the topics are conventional and advanced electron transmission microscopy, observing chemical reactions using transmission electron microscopy, in-situ transmission electron microscopy studies of oxidation, current-induced transport: electromigration, and cathodoluminescence in scanning and transmission electron microscopies. Annotation ©2012 Book News, Inc., Portland, OR (booknews.com)

Adopting a didactical approach from fundamentals to actual experiments and applications, this handbook and ready reference covers modern focused ion beam workstations, scanning electron microscopes and transmission electron microscopes, while also showing how to combine them for real-time observation.

Adopting a didactical approach from fundamentals to actual experiments and applications, this handbook and ready reference covers
real-time observations using modern scanning electron microscopy and transmission electron microscopy, while also providing information
on the required stages and samples. The text begins with introductory material and the basics, before describing advancements and applications in dynamic transmission electron microscopy and reflection electron microscopy. Subsequently, the techniques needed to determine growth processes, chemical reactions and oxidation, irradiation effects, mechanical, magnetic, and ferroelectric properties as well as cathodoluminiscence and electromigration are discussed.
List of Contributors
xiii
Preface xvii
Part I Basics and Methods
1(122)
1 Introduction to Scanning Electron Microscopy
3(36)
Christina Scheu
Wayne D. Kaplan
1.1 Components of the Scanning Electron Microscope
4(12)
1.1.1 Electron Guns
6(3)
1.1.2 Electromagnetic Lenses
9(4)
1.1.3 Deflection System
13(1)
1.1.4 Electron Detectors
13(1)
1.1.4.1 Everhart-Thornley Detector
13(2)
1.1.4.2 Scintillator Detector
15(1)
1.1.4.3 Solid-State Detector
16(1)
1.1.4.4 In-Lens or Through-the-Lens Detectors
16(1)
1.2 Electron-Matter Interaction
16(12)
1.2.1 Backscattered Electrons (BSEs)
20(2)
1.2.2 Secondary Electrons (SEs)
22(3)
1.2.3 Auger Electrons (AEs)
25(1)
1.2.4 Emission of Photons
25(1)
1.2.4.1 Emission of X-Rays
25(1)
1.2.4.2 Emission of Visible light
26(1)
1.2.5 Interaction Volume and Resolution
26(1)
1.2.5.1 Secondary Electrons
27(1)
1.2.5.2 Backscattered Electrons
27(1)
1.2.5.3 X-Rays
27(1)
1.3 Contrast Mechanisms
28(3)
1.3.1 Topographic Contrast
28(3)
1.3.2 Composition Contrast
31(1)
1.3.3 Channeling Contrast
31(1)
1.4 Electron Backscattered Diffraction (EBSD)
31(3)
1.5 Dispersive X-Ray Spectroscopy
34(2)
1.6 Other Signals
36(1)
1.7 Summary
36(3)
References
37(2)
2 Conventional and Advanced Electron Transmission Microscopy
39(32)
Christoph Koch
2.1 Introduction
39(9)
2.1.1 Introductory Remarks
39(1)
2.1.2 Instrumentation and Basic Electron Optics
40(2)
2.1.3 Theory of Electron-Specimen Interaction
42(6)
2.2 High-Resolution Transmission Electron Microscopy
48(6)
2.3 Conventional TEM of Defects in Crystals
54(1)
2.4 Lorentz Microscopy
55(2)
2.5 Off-Axis and Inline Electron Holography
57(2)
2.6 Electron Diffraction Techniques
59(2)
2.6.1 Fundamentals of Electron Diffraction
59(2)
2.7 Convergent Beam Electron Diffraction
61(2)
2.7 A Large-Angle Convergent Beam Electron Diffraction
63(1)
2.7.2 Characterization of Amorphous Structures by Diffraction
63(1)
2.8 Scanning Transmission Electron Microscopy and Z-Contrast
63(3)
2.9 Analytical TEM
66(5)
References
67(4)
3 Dynamic Transmission Electron Microscopy
71(28)
Thomas LaGrange
Bryan W. Reed
Wayne E. King
Judy S. Kim
Geoffrey H. Campbell
3.1 Introduction
71(1)
3.2 How Does Single-Shot DTEM Work?
72(10)
3.2.1 Current Performance
74(1)
3.2.2 Electron Sources and Optics
75(5)
3.2.3 Arbitrary Waveform Generation Laser System
80(1)
3.2.4 Acquiring High Time Resolution Movies
81(1)
3.3 Experimental Applications of DTEM
82(6)
3.3.1 Diffusionless First-Order Phase Transformations
82(3)
3.3.2 Observing Transient Phenomena in Reactive Multilayer Foils
85(3)
3.4 Crystallization Under Far-from-Equilibrium Conditions
88(2)
3.5 Space Charge Effects in Single-Shot DTEM
90(1)
3.5.1 Global Space Charge
90(1)
3.5.2 Stochastic Blurring
91(1)
3.6 Next-Generation DTEM
91(3)
3.6.1 Novel Electron Sources
91(1)
3.6.2 Relativistic Beams
92(1)
3.6.3 Pulse Compression
93(1)
3.6.4 Aberration Correction
93(1)
3.7 Conclusions
94(5)
References
95(4)
4 Formation of Surface Patterns Observed with Reflection Electron Microscopy
99(24)
Alexander V. Latyshev
4.1 Introduction
99(3)
4.2 Reflection Electron Microscopy
102(5)
4.3 Silicon Substrate Preparation
107(2)
4.4 Monatomic Steps
109(2)
4.5 Step Bunching
111(3)
4.6 Surface Reconstructions
114(1)
4.7 Epitaxial Growth
115(1)
4.8 Thermal Oxygen Etching
116(3)
4.9 Conclusions
119(4)
Part II Growth and Interactions
123(86)
5 Electron and Ion Irradiation
125(20)
Florian Banhart
5.1 Introduction
125(1)
5.2 The Physics of Irradiation
126(3)
5.2.1 Scattering of Energetic Particles in Solids
126(2)
5.2.2 Scattering of Electrons
128(1)
5.2.3 Scattering of Ions
129(1)
5.3 Radiation Defects in Solids
129(2)
5.3.1 The Formation of Defects
129(1)
5.3.2 The Migration of Defects
130(1)
5.4 The Setup in the Electron Microscope
131(1)
5.4.1 Electron Irradiation
131(1)
5.4.2 Ion Irradiation
132(1)
5.5 Experiments
132(9)
5.5.1 Electron Irradiation
133(7)
5.5.2 Ion Irradiation
140(1)
5.6 Outlook
141(4)
References
142(3)
6 Observing Chemical Reactions Using Transmission Electron Microscopy
145(27)
Renu Sharma
6.1 Introduction
145(1)
6.2 Instrumentation
146(4)
6.3 Types of Chemical Reaction Suitable for TEM Observation
150(4)
6.3.1 Oxidation and Reduction (Redox) Reactions
150(1)
6.3.2 Phase Transformations
151(1)
6.3.3 Polymerization
152(1)
6.3.4 Nitridation
152(1)
6.3.5 Hydroxylation and Dehydroxylation
152(1)
6.3.6 Nucleation and Growth of Nanostructures
153(1)
6.4 Experimental Setup
154(3)
6.4.1 Reaction of Ambient Environment with Various TEM Components
154(1)
6.4.2 Reaction of Grid/Support Materials with the Sample or with Each Other
154(1)
6.4.3 Temperature and Pressure Considerations
155(1)
6.4.4 Selecting Appropriate Characterization Technique(s)
156(1)
6.4.5 Recording Media
156(1)
6.4.6 Independent Verification of the Results, and the Effects of the Electron Beam
157(1)
6.5 Available Information Under Reaction Conditions
157(7)
6.5.1 Structural Modification
158(1)
6.5.1.1 Electron Diffraction
158(1)
6.5.1.2 High-Resolution Imaging
158(4)
6.5.2 Chemical Changes
162(2)
6.5.3 Reaction Rates (Kinetics)
164(1)
6.6 Limitations and Future Developments
164(8)
References
165(7)
7 In-Situ TEM Studies of Vapor- and Liquid-Phase Crystal Growth
172(20)
Frances M. Ross
7.1 Introduction
171(1)
7.2 Experimental Considerations
172(3)
7.2.1 What Crystal Growth Experiments are Possible?
172(1)
7.2.2 How Can These Experiments be Made Quantitative?
173(2)
7.2.3 How Relevant Can These Experiments Be?
175(1)
7.3 Vapor-Phase Growth Processes
175(8)
7.3.1 Quantum Dot Growth Kinetics
176(1)
7.3.2 Vapor-Liquid-Solid Growth of Nanowires
177(3)
7.3.3 Nucleation Kinetics in Nanostructures
180(3)
7.4 Liquid-Phase Growth Processes
183(4)
7.4.1 Observing Liquid Samples Using TEM
183(1)
7.4.2 Electrochemical Nucleation and Growth in the TEM System
184(3)
7.5 Summary
187(5)
References
188(4)
8 In-Situ TEM Studies of Oxidation
192(17)
Guangwen Zhou
Judith C. Yang
8.1 Introduction
191(1)
8.2 Experimental Approach
192(4)
8.2.1 Environmental Cells
192(1)
8.2.2 Surface and Environmental Conditions
193(1)
8.2.3 Gas-Handling System
194(1)
8.2.4 limitations
195(1)
8.3 Oxidation Phenomena
196(9)
8.3.1 Surface Reconstruction
196(1)
8.3.2 Nucleation and Initial Oxide Growth
197(1)
8.3.3 Role of Surface Defects on Surface Oxidation
198(1)
8.3.4 Shape Transition During Oxide Growth in Alloy Oxidation
199(3)
8.3.5 Effect of Oxygen Pressure on the Orientations of Oxide Nuclei
202(1)
8.3.6 Oxidation Pathways Revealed by High-Resolution TEM Studies of Oxidation
203(2)
8.4 Future Developments
205(1)
8.5 Summary
206(3)
References
206(3)
Part III Mechanical Properties
209(70)
9 Mechanical Testing with the Scanning Electron Microscope
211(16)
Christian Motz
9.1 Introduction
211(1)
9.2 Technical Requirements and Specimen Preparation
212(2)
9.3 In-Situ Loading of Macroscopic Samples
214(3)
9.3.1 Static Loading in Tension, Compression, and Bending
214(2)
9.3.2 Dynamic Loading in Tension, Compression, and Bending
216(1)
9.3.3 Applications of In-Situ Testing
216(1)
9.4 In-Situ Loading of Micron-Sized Samples
217(6)
9.4.1 Static Loading of Micron-Sized Samples in Tension, Compression, and Bending
218(2)
9.4.2 Applications of In-Situ Testing of Small-Scale Samples
220(2)
9.4.3 In-Situ Microindentation and Nanoindentation
222(1)
9.5 Summary and Outlook
223(4)
References
223(4)
10 In-Situ TEM Straining Experiments: Recent Progress in Stages and Small-Scale Mechanics
227(28)
Gerhard Dehm
Marc Legros
Daniel Kiener
10.1 Introduction
227(1)
10.2 Available Straining Techniques
228(5)
10.2.1 Thermal Straining
228(1)
10.2.2 Mechanical Straining
229(1)
10.2.3 Instrumented Stages and MEMS/NEMS Devices
230(3)
10.3 Dislocation Mechanisms in Thermally Strained Metallic Films
233(6)
10.3.1 Basic Concepts
233(2)
10.3.2 Dislocation Motion in Single Crystalline Films and Near Interfaces
235(1)
10.3.3 Dislocation Nucleation and Multiplication in Thin Films
236(3)
10.3.4 Diffusion-Induced Dislocation Plasticity in Polycrystalline Cu Films
239(1)
10.4 Size-Dependent Dislocation Plasticity in Metals
239(8)
10.4.1 Plasticity in Geometrically Confined Single Crystal fee Metals
241(2)
10.4.2 Size-Dependent Transitions in Dislocation Plasticity
243(1)
10.4.3 Plasticity by Motion of Grain Boundaries
244(1)
10.4.4 Influence of Grain Size Heterogeneities
245(2)
10.5 Conclusions and Future Directions
247(8)
References
248(7)
11 In-Situ Nanoindentation in the Transmission Electron Microscope
255(24)
Andrew M. Minor
11.1 Introduction
255(5)
11.1.1 The Evolution of In-Situ Mechanical Probing in a TEM
255(1)
11.1.2 Introduction to Nanoindentation
256(4)
11.2 Experimental Methodology
260(3)
11.3 Example Studies
263(9)
11.3.1 In-Situ TEM Nanoindentation of Silicon
263(6)
11.3.2 In-Situ TEM Nanoindentation of Al Thin Films
269(3)
11.4 Conclusions
272(7)
References
274(5)
Part IV Physical Properties
279(92)
12 Current-Induced Transport: Electromigration
281(22)
Ralph Spolenak
12.1 Principles
281(2)
12.2 Transmission Electron Microscopy
283(6)
12.2.1 Imaging
283(5)
12.2.2 Diffraction
288(1)
12.2.3 Convergent Beam Electron Diffraction (CBED): Measurements of Elastic Strain
288(1)
12.3 Secondary Electron Microscopy
289(3)
12.3.1 Imaging
289(2)
12.3.2 Elemental Analysis
291(1)
12.3.3 Electron Backscatter Diffraction (EBSD)
292(1)
12.4 X-Radiography Studies
292(3)
12.4.1 Microscopy and Tomography
292(1)
12.4.2 Spectroscopy
293(1)
12.4.3 Topography
294(1)
12.4.4 Microdiffraction
294(1)
12.5 Specialized Techniques
295(2)
12.5.1 Focused Ion Beams
295(1)
12.5.2 Reflective High-Energy Electron Diffraction (RHEED)
296(1)
12.5.3 Scanning Probe Methods
296(1)
12.6 Comparison of M-Situ Methods
297(6)
References
299(4)
13 Cathodoluminescence in Scanning and Transmission Electron Microscopies
303(18)
Yutaka Ohno
Seiji Takeda
13.1 Introduction
303(1)
13.2 Principles of Cathodoluminsecence
304(3)
13.2.1 The Generation and Recombination of Electron-Hole Pairs
304(1)
13.2.2 Characteristic of CL Spectroscopy
305(1)
13.2.3 CL Imaging and Contrast Analysis
306(1)
13.2.4 Spatial Resolution of CL Imaging and Spectroscopy
306(1)
13.2.5 CL Detection Systems
307(1)
13.3 Applications of CL in Scanning and Transmission Electron Microscopies
307(6)
13.3.1 Assessments of Group III-V Compounds
308(1)
13.3.1.1 Nitrides
308(1)
13.3.1.2 III-V Compounds Except Nitrides
309(1)
13.3.2 Group II---VI Compounds and Related Materials
310(1)
13.3.2.1 Oxides
310(2)
13.3.2.2 Group II-VI Compounds, Except Oxides
312(1)
13.3.3 Group IV and Related Materials
313(1)
13.4 Concluding Remarks
313(8)
References
313(8)
14 In-Situ TEM with Electrical Bias on Ferroelectric Oxides
321(26)
Xiaoli Tan
14.1 Introduction
321(2)
14.2 Experimental Details
323(1)
14.3 Domain Polarization Switching
324(2)
14.4 Grain Boundary Cavitation
326(5)
14.5 Domain Wall Fracture
331(4)
14.6 Antiferroelectric-to-Ferroelectric Phase Transition
335(6)
14.7 Relaxor-to-Ferroelectric Phase Transition
341(6)
References
345(2)
15 Lorentz Microscopy
347(24)
Josef Zweck
15.1 Introduction
347(3)
15.2 The In-Situ Creation of Magnetic Fields
350(12)
15.2.1 Combining the Objective Lens Field with Specimen Tilt
351(1)
15.2.2 Magnetizing Stages Using Coils and Pole-Pieces
352(4)
15.2.3 Magnetizing Stages Without Coils
356(1)
15.2.3.1 Oersted Fields
356(2)
15.2.3.2 Spin Torque Applications
358(3)
15.2.3.3 Self-Driven Devices
361(1)
15.3 Examples
362(4)
15.3.1 Demagnetization and Magnetization of Ring Structures
362(2)
15.3.2 Determination of Wall Velocities
364(1)
15.3.3 Determination of Stray Fields
365(1)
15.4 Problems
366(1)
15.5 Conclusions
367(4)
References
367(4)
Index 371
Professor Gerhard Dehm is the department head of Materials Physics at the Montanuniversität Leoben, Austria, and director of the Erich Schmid Institute of Materials Science from the Austrian Academy of Sciences. He has worked previously at the Max-Planck-Institute for Metals Research in Stuttgart and the Department of Materials Engineering at the Technion in Haifa. Gerhard Dehm has authored about 200 scientific publications and organized several international symposia in the field of in situ characterization. He received several scientific awards including the Masing Award from the German Society of Materials Science (DGM) and the award for Nanosciences and Nanotechnology from the State of Styria (Austria).

James M. Howe is the Thomas Goodwin Digges Chaired Professor and Director of the Nanoscale Materials Characterization Facility in the Department of Materials Science and Engineering at the University of Virginia (USA). He has been a visiting professor at the University of Vienna and Osaka University. Dr. Howe has published over 200 technical papers, four book chapters and four symposium proceedings, and is author of the textbook 'Interfaces in Materials' and co-author of the textbook 'Transmission Electron Microscopy and Diffractometry of Materials'. For his research, he has received several awards including a von Humboldt Senior Research Award, the ASM Materials Science Research Silver Medal, and the TMS Champion H. Mathewson Medal.

Professor Josef Zweck is head of the electron microscopy group at the University of Regensburg's physics faculty (Germany). An important branch of his work specializes in imaging of intrinsic magnetic and electrostatic fields and their in-situ manipulation by specialized specimen holders. He is board member of Germany's society for electron microscopy (DGE) since 1996 and presides it in the years 2012 and 2013. He has authored well over 100 scientific publications and is referee for numerous scientific journals. He was involved in numerous organizations of the German Physical society's (DPG, Deutsche Physikalische Gesellschaft) annual meetings, as well as national and international congresses on electron microscopy, especially in 1997 when he hosted the 'Dreiländertagung' ('three countries conference', Austria, Switzerland and Germany) in Regensburg. This congress will return to Regensburg in 2013 as a multinational conference with now 10 countries involved.
Püsilink: https://www.kriso.ee/db/9783527652167_pe.html