Preface |
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vii | |
Acknowledgments |
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ix | |
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1 | (14) |
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0.1 Semiconductor Devices |
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1 | (5) |
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0.2 Semiconductor Technology |
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6 | (9) |
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12 | (3) |
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PART I SEMICONDUCTOR PHYSICS |
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Chapter 1 Energy Bands and Carrier Concentration in Thermal Equilibrium |
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15 | (28) |
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1.1 Semiconductor Materials |
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15 | (2) |
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1.2 Basic Crystal Structures |
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17 | (5) |
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22 | (1) |
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23 | (6) |
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1.5 Intrinsic Carrier Concentration |
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29 | (5) |
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34 | (9) |
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40 | (3) |
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Chapter 2 Carrier Transport Phenomena |
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43 | (39) |
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43 | (10) |
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53 | (3) |
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2.3 Generation and Recombination Processes |
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56 | (6) |
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62 | (6) |
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2.5 Thermionic Emission Process |
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68 | (1) |
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69 | (2) |
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71 | (2) |
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73 | (9) |
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77 | (5) |
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PART II SEMICONDUCTOR DEVICES |
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82 | (41) |
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3.1 Thermal Equilibrium Condition |
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83 | (4) |
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87 | (8) |
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3.3 Depletion Capacitance |
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95 | (4) |
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3.4 Current-Voltage Characteristics |
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99 | (9) |
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3.5 Charge Storage and Transient Behavior |
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108 | (3) |
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111 | (6) |
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117 | (6) |
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120 | (3) |
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Chapter 4 Bipolar Transistors and Related Devices |
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123 | (37) |
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124 | (5) |
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4.2 Static Characteristics of Bipolar Transistors |
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129 | (8) |
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4.3 Frequency Response and Switching of Bipolar Transistors |
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137 | (5) |
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142 | (4) |
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4.5 Heterojunction Bipolar Transistors |
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146 | (3) |
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4.6 Thyristors and Related Power Devices |
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149 | (11) |
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155 | (5) |
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Chapter 5 MOS Capacitor and MOSFET |
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160 | (35) |
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160 | (9) |
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5.2 SiO2-Si MOS Capacitor |
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169 | (5) |
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5.3 Carrier Transport in MOS Capacitors |
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174 | (3) |
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5.4 Charge-Coupled Devices |
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177 | (3) |
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180 | (15) |
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192 | (3) |
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Chapter 6 Advanced MOSFET and Related Devices |
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195 | (33) |
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195 | (10) |
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205 | (5) |
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210 | (4) |
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6.4 MOS Memory Structures |
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214 | (9) |
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223 | (5) |
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224 | (4) |
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Chapter 7 MESFET and Related Devices |
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228 | (30) |
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7.1 Metal-Semiconductor Contacts |
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229 | (11) |
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240 | (9) |
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249 | (9) |
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255 | (3) |
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Chapter 8 Microwave Diodes; Quantum-Effect and Hot-Electron Devices |
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258 | (22) |
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8.1 Microwave Frequency Bands |
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259 | (1) |
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260 | (1) |
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260 | (5) |
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8.4 Transferred-Electron Devices |
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265 | (4) |
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8.5 Quantum-Effect Devices |
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269 | (5) |
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274 | (6) |
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277 | (3) |
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Chapter 9 Light Emitting Diodes and Lasers |
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280 | (43) |
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9.1 Radiative Transitions and Optical Absorption |
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280 | (6) |
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9.2 Light-Emitting Diodes |
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286 | (5) |
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9.3 Various Light-Emitting Diodes |
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291 | (11) |
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302 | (21) |
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319 | (4) |
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Chapter 10 Photodetectors and Solar Cells |
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323 | (34) |
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323 | (13) |
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336 | (7) |
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10.3 Silicon and Compound-Semiconductor Solar Cells |
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343 | (5) |
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10.4 Third-Generation Solar Cells |
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348 | (4) |
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10.5 Optical Concentration |
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352 | (5) |
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352 | (5) |
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PART III SEMICONDUCTOR TECHNOLOGY |
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Chapter 11 Crystal Growth and Epitaxy |
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357 | (35) |
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11.1 Silicon Crystal Growth from the Melt |
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357 | (6) |
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11.2 Silicon Float-Zone Proces |
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363 | (4) |
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11.3 GaAs Crystal-Growth Techniques |
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367 | (3) |
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11.4 Material Characterization |
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370 | (7) |
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11.5 Epitaxial-Growth Techniques |
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377 | (7) |
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11.6 Structures and Defects in Epitaxial Layers |
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384 | (8) |
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388 | (4) |
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Chapter 12 Film Formation |
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392 | (36) |
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392 | (8) |
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12.2 Chemical Vapor Deposition of Dielectrics |
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400 | (9) |
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12.3 Chemical Vapor Deposition of Polysilicon |
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409 | (3) |
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12.4 Atom Layer Deposition |
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412 | (2) |
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414 | (14) |
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425 | (3) |
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Chapter 13 Lithography and Etching |
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428 | (38) |
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428 | (13) |
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13.2 Next-Generation Lithographic Methods |
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441 | (6) |
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13.3 Wet Chemical Etching |
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447 | (3) |
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450 | (16) |
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462 | (4) |
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Chapter 14 Impurity Doping |
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466 | (39) |
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14.1 Basic Diffusion Process |
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467 | (9) |
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476 | (4) |
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14.3 Diffusion-Related Processes |
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480 | (3) |
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14.4 Range of Implanted Ions |
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483 | (7) |
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14.5 Implant Damage and Annealing |
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490 | (5) |
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14.6 Implantation-Related Processes |
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495 | (10) |
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501 | (4) |
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Chapter 15 Integrated Devices |
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505 | (36) |
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507 | (4) |
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511 | (5) |
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516 | (13) |
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529 | (3) |
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15.5 Challenges for Nanoelectronics |
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532 | (9) |
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537 | (4) |
Appendix A List of Symbols |
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541 | (2) |
Appendix B International Systems of Units (SI Units) |
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543 | (1) |
Appendix C Unit Prefixes |
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544 | (1) |
Appendix D Greek Alphabet |
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545 | (1) |
Appendix E Physical Constants |
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546 | (1) |
Appendix F Properties of Important Element and Binary Compound Semiconductors at 300 K |
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547 | (1) |
Appendix G Properties of Si and GaAs at 300 K |
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548 | (1) |
Appendix H Derivation of the Density of States in a Semiconductor |
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549 | (4) |
Appendix I Derivation of Recombination Rate for Indirect Recombination |
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553 | (2) |
Appendix J Calculation of the Transmission Coefficient for a Symmetric Resonant-Tunneling Diode |
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555 | (2) |
Appendix K Basic Kinetic Theory of Gases |
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557 | (2) |
Appendix L Answers to Selected Problems |
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559 | (4) |
Photo credits |
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563 | (2) |
Index |
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565 | |