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E-raamat: Sputtered Thin Films: Theory and Fractal Descriptions [Taylor & Francis e-raamat]

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  • Formaat: 196 pages, 11 Tables, black and white; 68 Line drawings, black and white; 26 Halftones, black and white; 94 Illustrations, black and white
  • Sari: Engineering Materials
  • Ilmumisaeg: 13-Apr-2021
  • Kirjastus: CRC Press
  • ISBN-13: 9781003053507
Teised raamatud teemal:
  • Taylor & Francis e-raamat
  • Hind: 230,81 €*
  • * hind, mis tagab piiramatu üheaegsete kasutajate arvuga ligipääsu piiramatuks ajaks
  • Tavahind: 329,73 €
  • Säästad 30%
Sputtered Thin Films: Theory and Fractal DescriptionsSuurem pilt
  • Formaat: 196 pages, 11 Tables, black and white; 68 Line drawings, black and white; 26 Halftones, black and white; 94 Illustrations, black and white
  • Sari: Engineering Materials
  • Ilmumisaeg: 13-Apr-2021
  • Kirjastus: CRC Press
  • ISBN-13: 9781003053507
Teised raamatud teemal:
Taylor & Francis e-raamatudRohkem infot Taylor & Francis e-raamatute kohta
Raamatu kodulehekülg: https://www.taylorfrancis.com/books/9781003053507
Sputtered Thin Films: Theory and Fractal Descriptions provides an overview of sputtered thin films and demystifies the concept of fractal theory in analysis of sputtered thin films. It simplifies the use of fractal tools in studying the growth and properties of thin films during sputtering processes. Part 1 of the book describes the basics and theory of thin film sputtering and fractals. Part 2 consists of examples illustrating specific descriptions of thin films using fractal methods.











Discusses thin film growth, structure, and properties





Covers fractal theory





Presents methods of fractal measurements





Offers typical examples of fractal descriptions of thin films grown via magnetron sputtering processes





Describes application of fractal theory in prediction of thin film growth and properties

This reference book is aimed at engineers and scientists working across a variety of disciplines including materials science and metallurgy as well as mechanical, manufacturing, electrical, and biomedical engineering.
Preface xi
Acknowledgments xiii
Authors xv
PART 1 Theory
Chapter 1 Thin Film Growth, Structure, and Properties
3(28)
1.1 Introduction
3(1)
1.2 Markets and Trends
4(5)
1.3 Theory of Thin Films and Growth
9(8)
1.3.1 Classification of Thin Film Deposition Methods
9(2)
1.3.2 Chemical Vapor Deposition Methods, CVD
11(2)
1.3.3 Physical Vapor Deposition Method, PVD
13(3)
1.3.4 Mechanism of Thin Film Growth
16(1)
1.4 Theory of Sputtering Technology
17(6)
1.4.1 Science of Sputtering
17(3)
1.4.2 Sputtering Technologies
20(1)
1.4.3 Magnetron Sputtering
21(1)
1.4.4 Factors Affecting Thin Film Magnetron Sputtering
22(1)
1.5 Parameter-Property Relationships of Sputtered Films
23(1)
1.6 Sputtering of Patterned Thin Films
24(1)
1.7 Summary
25(6)
References
26(5)
Chapter 2 Fractal Theory
31(18)
2.1 Introduction
31(1)
2.2 Definitions of Fractals and Properties
32(3)
2.3 Examples of Fractals
35(2)
2.4 Applications of Fractal Theory in Engineering
37(4)
2.5 Thin Film Growth and Fractal Theory
41(4)
2.6 Summary
45(4)
References
45(4)
Chapter 3 Methods of Fractal Measurements
49(32)
3.1 Introduction
49(1)
3.2 Box Counting Method
50(4)
3.3 Triangulation Method
54(2)
3.4 Brownian Motion Methods
56(8)
3.5 Multifractal Theory
64(7)
3.5.1 Basic Formulations
64(4)
3.5.2 Multifractal Detrended Fluctuation Analysis (MFDA)
68(2)
3.5.3 Applications of the Multifractal Theory
70(1)
3.6 Other Methods
71(1)
3.7 Summary
71(10)
References
71(10)
PART 2 Typical Studies of Fractal Descriptions of Sputtered Films
Chapter 4 Fractal Characterization of Hillocks and Porosity in Sputtered Films
81(20)
4.1 Introduction
81(3)
4.2 Hillocks in Sputtered Thin Films
84(2)
4.3 Fractal Characterization of Hillocks in Sputtered Metallic/Alloy Thin Films
86(6)
4.4 Fractal Studies of Porosity in Sputtered Metallic/Alloy Thin Films
92(5)
4.5 Summary
97(4)
References
97(4)
Chapter 5 Mono-Fractal Analyses of Roughness of Sputtered Films
101(36)
5.1 Introduction
101(1)
5.2 Vertical and Lateral Roughening in Sputtering
101(2)
5.3 The Relationship Between Lateral and Vertical Roughness in Sputtering of Metallic/Alloy Thin Films
103(24)
5.3.1 Case 1: Topology and Fractal Analysis of Thin Aluminium Films Grown by Radio-Frequency Magnetron Sputtering
103(19)
5.3.2 Case 2: Fractal Nature of Surface Topography and Physical Properties of the Coatings Obtained Using Magnetron Sputtering by Kwasny, Dobrzanski, Pawlyta, and Guilbinski (2004)
122(2)
5.3.3 Case 3: Dependence of Fractal Characteristics on the Scan Size of AFM Phase Imaging of Aluminium Thin Films, by Mwema, Akinlabi, and Oladijo (2020)
124(1)
5.3.4 Case 4: Effect of Angle of Deposition on the Fractal Properties of ZnO Thin Film Surface by Yadav et al. (2017)
125(1)
5.3.5 Relationship Between Fractal Roughness and Vertical Roughness
125(2)
5.4 Influence of Sputtering Parameters on Fractal Characteristics of Thin Films
127(4)
5.4.1 Effect of Substrate Type
127(1)
5.4.2 Effect of Substrate Temperature
128(2)
5.4.3 Effect of Sputtering Power
130(1)
5.4.4 Other Parameters
130(1)
5.5 Fractal and Roughness Studies in Multi-Layer Sputtered Thin Films
131(1)
5.6 Summary
131(6)
References
132(5)
Chapter 6 Multifractal Characterization of Structure Evolution with Sputtering Parameters of Thin Films
137(32)
6.1 Introduction
137(2)
6.2 Multifractal Studies of Sputtered Pure Metallic Films
139(15)
6.3 Multifractal Studies of Sputtered Metallic Alloy Thin Films
154(8)
6.4 Multifractal Descriptions of Sputtered Multilayer Thin Films
162(1)
6.5 Summary
163(6)
References
164(5)
Chapter 7 Fractal Prediction of Film Growth and Properties
169(26)
7.1 Introduction
169(1)
7.2 Morphological Classification of Thin Film Surfaces
170(4)
7.2.1 Columnar Structure of Thin Films
171(2)
7.2.2 Ballistic Structure Models
173(1)
7.2.3 Fibrous Thin Films
173(1)
7.2.4 Pile-Up Particles
174(1)
7.3 Fractal Characterization of Thin Film Morphologies
174(15)
7.3.1 Columnar Structures
175(6)
7.3.2 Ballistic Structures
181(3)
7.3.3 Fibrous Model of Thin Film Structures
184(1)
7.3.4 Pile-Up Particles
185(4)
7.4 Fractal Image Analyses, Growth, and Property Prediction
189(2)
7.5 Summary
191(4)
References
191(4)
Index 195
Fredrick Madaraka Mwema received his PhD in Mechanical Engineering from the University of Johannesburg, South Africa, with a concentration on Advanced Manufacturing and Materials Processing.



Esther Titilayo Akinlabi is Professor in the Department of Mechanical Engineering Science, University of Johannesburg. South Africa. From 2017 to 2018 she served as Vice Dean, Teaching and Learning, Faculty of Engineering and the Built Environment, University of Johannesburg. Her expertise and skills include Laser based Additive Manufacturing, Welding processes: Friction Stir Welding and Processing, Metal Matrix and Fibre Crimp Composites, Characterizations and Mechanical testing of Metallic and Non-metallic Materials, and Design and Process Optimization of Energy, Mechanical and Manufacturing systems. Prof. Akinlabi has consulted for South Africa Agency for Science and Technology Advancement (SAASTA), Vikinduku Engineering and Projects, and Siemens South Africa.



Oluseyi Philip Oladijo is Senior Lecturer at Botswana International University of Science & Technology. He received his PhD from University of the Witwatersrand Johannesburg, South Africa.
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