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Advances in Imaging and Electron Physics, Volume 202 [Kõva köide]

(Founder-President of the European Microscopy Society and Fellow, Microscopy and Optical Societies of America; member of the editorial boards of several microscopy journals and Serial Editor, Advances in Electron Optics, France)
  • Formaat: Hardback, 166 pages, kõrgus x laius: 229x152 mm, kaal: 450 g
  • Sari: Advances in Imaging and Electron Physics
  • Ilmumisaeg: 30-Aug-2017
  • Kirjastus: Academic Press Inc
  • ISBN-10: 0128120886
  • ISBN-13: 9780128120880
Teised raamatud teemal:
  • Formaat: Hardback, 166 pages, kõrgus x laius: 229x152 mm, kaal: 450 g
  • Sari: Advances in Imaging and Electron Physics
  • Ilmumisaeg: 30-Aug-2017
  • Kirjastus: Academic Press Inc
  • ISBN-10: 0128120886
  • ISBN-13: 9780128120880
Teised raamatud teemal:

Advances in Imaging and Electron Physics, Volume 202, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy.

The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.

  • Contains contributions from leading authorities on the subject matter
  • Informs and updates on all the latest developments in the field of imaging and electron physics
  • Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electron and ion emission with a valuable resource
  • Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing

Muu info

Cutting-edge articles on the latest developments in all areas of microscopy, image science, and many related subjects in electron physics
Contributors vii
Preface ix
Future Contributions xi
1 Non-Negative Sparse Mathematical Morphology
1(38)
Jesus Angulo
Santiago Velasco-Forero
1 Introduction
1(5)
2 NMF and Sparse Variants
6(4)
2.1 Definition of NMF on Vector Space
6(1)
2.2 Basic NMF Algorithms
7(1)
2.3 NMF with Sparseness Constraints
8(1)
2.4 A Few Properties of NMF
9(1)
3 Sparse Approximation to Binary Morphological Operators
10(9)
3.1 Sparse NMF Approximations of Binary Sets
10(1)
3.2 Sparse Max-Approximation to Binary Dilation and Erosion
11(5)
3.3 Sparse Max-Approximation to Binary Opening and Closing
16(1)
3.4 Consistency and Noise Robustness of Sparse Morphological Operators
17(2)
4 Sparse Approximation to Numerical Morphological Operators
19(6)
4.1 Sparse-NMF Processing of Upper Level Sets
20(3)
4.2 Sparse-NMF Representation and Processing of Gray-Scale Images
23(2)
5 Applications
25(7)
5.1 Sparse Processing of Multivariate Boolean Textures
26(2)
5.2 Sparse Processing of Hyperspectral Images
28(4)
6 Conclusions and Perspectives
32(7)
References
34(5)
2 Disorder Modifications of the Critical Temperature for Superconductivity: A Perspective from the Point of View of Nanoscience
39(36)
Clifford M. Krowne
1 Introduction
39(6)
2 Phonon Operator and the Electron-Phonon Interaction
45(1)
3 Matsubara Many-Body Quantum Green's Functions for Phonons and Electrons
46(1)
4 Approximation of the Phonon Matsubara Propagator by Its Bare Value
47(3)
5 Finding the Renormalized Phonon Green's Function Due to Electron Screening
50(1)
6 Renormalized Electron Vertex Based on Phonon Modification
51(1)
7 Renormalized Total Potential Energy Due to Coulomb and Phonon Effects
52(1)
8 RPA Permittivity as Affected by the Correlation Function Polarization
53(2)
9 Disorder Characterized Impurity Scattering
55(2)
10 Ladder Superconducting Cooper Vertex with Disorder Incorporated
57(1)
11 Critical Temperature Obtained from a Cooper Instability Equation
58(9)
12 Relating the Disorder Potential Energy to the Gap Parameter
67(4)
13 Conclusions
71(4)
Acknowledgments
71(1)
References
72(3)
3 The Struggle to Overcome Spherical Aberration in Electron Optics
75(74)
Albert Septier
1 Introduction
76(1)
2 The Coefficient of Spherical Aberration
76(4)
2.1 Definition
76(2)
2.2 The General Expressions for the Coefficients
78(1)
2.3 The Impossibility of Correction in a Centered System Without Space Charge
79(1)
2.4 The Round Lens "Without Aberration"
79(1)
3 The Search for Lenses with Little Spherical Aberration
80(15)
3.1 Weak Lenses with Minimum Aberration
80(6)
3.2 Work on Strong Lenses
86(5)
3.3 Combinations of Lenses: Asymmetrical Lenses
91(4)
4 Attempts to Correct the Aperture Aberration
95(9)
4.1 High Frequency Lenses
96(1)
4.2 Electrostatic Charge
97(3)
4.3 Discontinuities in the Function Φ'(z)/Φ(z)
100(4)
4.4 Departure from Rotational Symmetry
104(1)
5 Correction by Means of Astigmatic Systems
104(31)
5.1 The General Principle
104(1)
5.2 Historical Survey of the Various Attempts at Correction
105(8)
5.3 Investigations of Quadrupole Lenses: Combinations Equivalent to Strongly Convergent Round Lenses
113(5)
5.4 The Aperture Aberrations of Quadrupole Lenses
118(17)
6 The Ultimate Performance of Corrected Systems
135(7)
6.1 Additional Aberrations Arising from Mechanical Defects
135(5)
6.2 Other Limitations
140(1)
6.3 Correction in Practice
140(2)
7 Perspectives for the Future
142(7)
7.1 The Present Situation
142(1)
7.2 New Means of Improvement
143(2)
References
145(4)
Index 149
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.