This special issue of the periodical Materials Science Forum contains 30 contributions from semiconductor technologists from nine different countries. Material is presented in sections on the various aspects of rapid thermal processing (RTP) and mill...Loe edasi...
A collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. It covers the following areas such as advanced MOS gate stack, integration techn...Loe edasi...
Rapid Thermal Processing (RTP) is a well established single-wafer technology in USLI semiconductor manufacturing and electrical engineering, as well as in materials science. The biggest advantage of RTP is that it eliminates the long-ramp-up and ramp...Loe edasi...
saadame teile pakkumise kasutatud raamatule, mille hind võib erineda kodulehel olevast hinnast
Contains contributions on a justification for rapid thermal processing, based epitaxy, rapid thermal growth and processing of dielectrics, thin-film deposition, extended defects from ion implantation and annealing, junction formation in silicon by ra...Loe edasi...
David Hodul, Jeffrey C. Gelpey, Martin L. Green, Thomas E. Seidel
Sari: MRS Proceedings
(Ilmumisaeg: 03-Nov-1989, Hardback, Kirjastus: Materials Research Society, ISBN-13: 9781558990197)
saadame teile pakkumise kasutatud raamatule, mille hind võib erineda kodulehel olevast hinnast
Papers from the symposium held April 1989, in San Diego cover recent developments in the traditional RTP subjects such as ion implant annealing in Si and III-V materials, metals processes (silicides and contact alloying), and oxide growth, in addit...Loe edasi...
