"The book represents an ultimate guide to DRAM technology for students as well as lecturers or experts in the field . It offers detailed descriptions of technology advancements together with motivations, focusing on cell topology, critical technological issues such as advanced lithography and patterning, new materials introduction and the evolved physics affecting cell parameters, as well as memory peripheral circuits in the system level . As a researcher working in the field related to new materials for DRAM cell capacitors, this book offers me a clear and complete view of DRAM technology and its advances, providing not only specifications, requirements, and restrictions but also a necessary deeper understanding of related physics and functionality issues." Dr. Milan Tapajna, Institute of Electrical Engineering, Slovak Academy of Sciences
"The main strength of this material is a good overview of all nearly relevant literature on DRAM cell development of the recent years." Till Schloesser, Infineon Technologies, Germany
"Quite a comprehensive treatment of regular DRAM technology but it ignores the new demands of wide I/O DRAM and the effects of packaging e.g. through-silicon vias reducing signal losses and thus lowering power. definitely a good historical survey and the lists of reference should be very useful to anyone researching the topic." Dick James, Chipworks Inc., Ottawa, Ontario, Canada