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High Resolution X-Ray Diffractometry And Topography [Kõva köide]

  • Formaat: Hardback, 262 pages, kõrgus x laius: 246x174 mm, kaal: 650 g
  • Ilmumisaeg: 05-Feb-1998
  • Kirjastus: Taylor & Francis Ltd
  • ISBN-10: 0850667585
  • ISBN-13: 9780850667585
  • Formaat: Hardback, 262 pages, kõrgus x laius: 246x174 mm, kaal: 650 g
  • Ilmumisaeg: 05-Feb-1998
  • Kirjastus: Taylor & Francis Ltd
  • ISBN-10: 0850667585
  • ISBN-13: 9780850667585
Describes the latest techniques in X-ray diffraction used in research, development, and production, and provides theoretical and practical background for applying these techniques in scientific and industrial materials characterization. Combines mathematical formalisms with graphical explanations and hands-on practical advice for interpreting data, with chapters on high resolution techniques, X-ray scattering theory, thin films and multiple layers, triple-axis X-ray diffractometry, and synchrotron radiation topography. Annotation c. by Book News, Inc., Portland, Or.

The study and application of electronic materials has created an increasing demand for sophisticated and reliable techniques for examining and characterizing these materials. This comprehensive book looks at the area of x-ray diffraction and the modern techniques available for deployment in research, development, and production. It provides the theoretical and practical background for applying these techniques in scientific and industrial materials characterization. The main aim of the book is to map the theoretical and practical background necessary to the study of single crystal materials by means of high-resolution x-ray diffraction and topography. It combines mathematical formalisms with graphical explanations and hands-on practical advice for interpreting data.

The rapid growth in the applications of electronic materials has created an increasing demand for reliable techniques for examining and characterizing these materials. This book explores the area of x-ray diffraction and the techniques available for deployment in research, development, and production. It maps the theoretical and practical background necessary to study single crystal materials using high resolution x-ray diffraction and topography. It combines mathematical formalism with graphical explanations and hands-on advice for interpreting data, thus providing the theoretical and practical background for applying these techniques in scientific and industrial materials characterization.
Introduction- diffraction studies of crystal perfection; high resolution X- ray diffraction techniques; analysis of expitaxial layers; X-ray scattering theory; simulation of X-ray diffraction rocking curves; analysis of thin films and multiple layers; triple axis X-ray diffractometry; single crystal X-ray topography; double crystal X-ray topography; synchrotron radiation topography.
Bowen, D.K.; Tanner, Brian K.