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Microwave Plasma Sources and Methods in Processing Technology [Kõva köide]

(Uppsala University, Sweden), (Uppsala University, Sweden)
  • Formaat: Hardback, 208 pages, kõrgus x laius x paksus: 10x10x10 mm, kaal: 454 g
  • Ilmumisaeg: 04-Mar-2022
  • Kirjastus: Wiley-IEEE Press
  • ISBN-10: 111982687X
  • ISBN-13: 9781119826873
Teised raamatud teemal:
Microwave Plasma Sources and Methods in Processing TechnologySuurem pilt
  • Formaat: Hardback, 208 pages, kõrgus x laius x paksus: 10x10x10 mm, kaal: 454 g
  • Ilmumisaeg: 04-Mar-2022
  • Kirjastus: Wiley-IEEE Press
  • ISBN-10: 111982687X
  • ISBN-13: 9781119826873
Teised raamatud teemal:
Püsilink: https://www.kriso.ee/db/9781119826873.html
Märksõnad:

A practical introduction to microwave plasma for processing applications at a variety of pressures

In Microwave Plasma Sources and Methods in Processing Technology, an award-winning team of researchers delivers a comprehensive introduction to microwaves and microwave-generated plasmas. Ideal for anyone interested in non-thermal gas discharge plasmas and their applications, the book includes detailed descriptions, explanations, and practical guidance for the study and use of microwave power, microwave components, plasma, and plasma generation.

This reference includes over 130 full-color diagrams to illustrate the concepts discussed within. The distinguished authors discuss the plasmas generated at different levels of power, as well as their applications at reduced, atmospheric and higher pressures. They also describe plasmas inside liquids and plasma interactions with combustion flames.

Microwave Plasma Sources and Methods in Processing Technology concludes with an incisive exploration of new trends in the study and application of microwave discharges, offering promising new areas of study.

The book also includes:

  • A thorough introduction to the basic principles of microwave techniques and power systems, including a history of the technology, microwave generators, waveguides, and wave propagation
  • A comprehensive exploration of the fundamentals of the physics of gas discharge plasmas, including plasma generation, Townsend coefficients, and the Paschen curve
  • Practical discussions of the interaction between plasmas and solid surfaces and gases, including PVD, PE CVD, oxidation, sputtering, evaporation, dry etching, surface activation, and cleaning
  • In-depth examinations of microwave plasma systems for plasma processing at varied parameters

Perfect for researchers and engineers in the microwave community, as well as those who work with plasma applications, Microwave Plasma Sources and Methods in Processing Technology will also earn a place in the libraries of graduate and PhD students studying engineering physics, microwave engineering, and plasmas.

Foreword from the Authors ix
1 Basic Principles and Components in the Microwave Techniques and Power Systems
1(36)
1.1 History in Brief - From Alternating Current to Electromagnetic Waves and to Microwaves
1(2)
1.2 Microwave Generators
3(2)
1.3 Waveguides and Electromagnetic Modes in Wave Propagation
5(9)
1.3.1 The Cut-off Frequency and the Wavelength in Waveguides
7(2)
1.3.2 Waveguides Filled by Dielectrics
9(1)
1.3.3 Wave Impedance and Standing Waves in Waveguides
10(2)
1.3.4 Coaxial Transmission Lines
12(2)
1.3.5 Microwave Resonators
14(1)
1.4 Waveguide Power Lines
14(14)
1.4.1 Magnetron Tube Microwave Generator
16(1)
1.4.2 Microwave Insulators
16(1)
1.4.3 Impedance Tuners
17(2)
1.4.4 Directional Couplers
19(1)
1.4.5 Passive Waveguide Components - Bends, Flanges, Vacuum Windows
20(2)
1.4.6 Tapered Waveguides and Waveguide Transformers
22(1)
1.4.7 Power Loads and Load Tuners
23(2)
1.4.8 Waveguide Phase Shifters
25(1)
1.4.9 Waveguide Shorting Plungers
25(1)
1.4.10 Coupling from Rectangular to Circular Waveguide: Resonant Cavities for Generation of Plasma
26(2)
1.5 Microwave Oven - A Most Common Microwave Power Device
28(9)
References
33(4)
2 Gas Discharge Plasmas
37(30)
2.1 Basic Understanding of the Gas Discharge Plasmas
37(3)
2.2 Generation of the Plasma, Townsend Coefficients, Paschen Curve
40(3)
2.3 Generation of the Plasma by AC Power, Plasma Frequency, Cut-off Density
43(7)
2.4 Space-charge Sheaths at Different Frequencies of the Incident Power
50(5)
2.5 Classification of Gas Discharge Plasmas, Effects of Gas Pressure, Microwave Generation of Plasmas
55(12)
2.5.1 Classification of Gas Discharge Plasmas
55(3)
2.5.2 Effects of the Gas Pressure on Particle Collisions in the Plasma
58(3)
2.5.3 Microwave Generation of Plasmas
61(3)
References
64(3)
3 Interactions of Plasmas with Solids and Gases
67(18)
3.1 Plasma Processing, PVD, and PE CVD
67(5)
3.2 Sputtering, Evaporation, Dry Etching, Cleaning, and Oxidation of Surfaces
72(3)
3.3 Particle Transport in Plasma Processing and Effects of Gas Pressure
75(4)
3.3.1 Movements of Neutral Particles
76(1)
3.3.2 Movements of Charged Particles
77(2)
3.3 Effect of the Gas Pressure on the Plasma Processing
79(2)
3.4 Afterglow and Decaying Plasma Processing
81(4)
References
83(2)
4 Microwave Plasma Systems for Plasma Processing at Reduced Pressures
85(50)
4.1 Waveguide-Generated Isotropic and Magnetoactive Microwave Plasmas
85(20)
4.1.1 Waveguide-Generated Isotropic Microwave Oxygen Plasma for Silicon Oxidation
87(6)
4.1.2 ECR and Higher Induction Magnetized Plasma Systems for Silicon Oxidation
93(12)
4.2 PE CVD of Silicon Nitride Films in the Far Afterglow
105(6)
4.3 Microwave Plasma Jets for PE CVD of Films
111(11)
4.3.1 Deposition of Carbon Nitride Films
115(4)
4.3.2 Surfajet Plasma Parameters and an Arrangement for Expanding the Plasma Diameter
119(3)
4.4 Hybrid Microwave Plasma System with Magnetized Hollow Cathode
122(13)
References
129(6)
5 Microwave Plasma Systems at Atmospheric and Higher Pressures
135(34)
5.1 Features of the Atmospheric Plasma and Cold Atmospheric Plasma (CAP) Sources
136(4)
5.2 Atmospheric Microwave Plasma Sources Assisted by Hollow Cathodes
140(11)
5.2.1 Applications of the H-HEAD Plasma Source in Surface Treatments
144(7)
5.3 Microwave Treatment of Diesel Exhaust
151(3)
5.4 Microwave Plasma in Liquids
154(3)
5.5 Microwave Plasma Interactions with Flames
157(4)
5.6 Microwave Plasmas at Very High Pressures
161(8)
References
162(7)
6 New Applications and Trends in the Microwave Plasmas
169(12)
References
176(5)
7 Appendices
181(8)
7.1 List of Symbols and Abbreviations
181(7)
7.2 Constants and Numbers
188(1)
Index 189
Ladislav Bárdo is Professor at the Department of Electrical Engineering at Uppsala University. He received his PhD from the Institute of Plasma Physics at the Czech Academy of Sciences in 1978 and DrSc from the Charles University Prague in 1995. He was awarded the Plasma Physics Innovation Prize 2019 by the European Physical Society.

Hana Baránková is Professor at the Department of Electrical Engineering, Uppsala University. She received her PhD from the Institute of Radio Engineering and Electronics at the Czech Academy of Sciences in 1981. She was awarded the Plasma Physics Innovation Prize 2019 by the European Physical Society. She is Secretary of the Board of Directors at the Society of Vacuum Coaters in the US.