Series Editor's Foreword |
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Preface |
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xi | |
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1 | (4) |
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5 | (32) |
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5 | (3) |
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2.2 OLED Device Principles and Mechanisms |
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8 | (29) |
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2.2.1 Basic Device Structure |
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8 | (2) |
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2.2.2 Light Emission Mechanism |
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10 | (16) |
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2.2.3 Emission Efficiency |
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26 | (4) |
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2.2.4 Lifetime and Image Burning |
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30 | (7) |
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3 OLED Manufacturing Process |
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37 | (32) |
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37 | (5) |
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3.1.1 Basic Material Properties |
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37 | (4) |
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3.1.2 Purification Process |
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41 | (1) |
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42 | (12) |
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42 | (5) |
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3.2.2 Evaporation Sources |
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47 | (7) |
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3.3 Shadow Mask Patterning |
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54 | (3) |
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57 | (4) |
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3.4.1 Dark Spot and Edge Growth Defects |
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57 | (1) |
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3.4.2 Light Emission from the Bottom and Top of the OLED Device |
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58 | (3) |
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61 | (8) |
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3.5.1 Ionization Potential Measurement |
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61 | (3) |
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64 | (1) |
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65 | (4) |
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69 | (36) |
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4.1 Comparison between OLED and LCD Modules |
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69 | (2) |
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4.2 Basic Display Design and Related Characteristics |
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71 | (20) |
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4.2.1 Luminous Intensity, Luminance, and Illuminance |
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71 | (5) |
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4.2.2 OLED Current and Power Efficiencies |
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76 | (4) |
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80 | (7) |
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4.2.4 Uniform Color Space |
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87 | (1) |
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4.2.5 White Point Determination |
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88 | (3) |
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4.3 Passive-Matrix OLED Display |
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91 | (5) |
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91 | (2) |
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93 | (3) |
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4.4 Active-Matrix OLED Display |
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96 | (9) |
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4.4.1 OLED Module Components |
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96 | (1) |
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4.4.2 Two-Transistor One-Capacitor (2T1C) Driving Circuit |
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97 | (3) |
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4.4.3 Ambient Performance |
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100 | (1) |
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101 | (4) |
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5 TFT Substrate for OLED Driving |
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105 | (38) |
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105 | (5) |
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110 | (10) |
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5.2.1 Low-Temperature Polysilicon Process Overview |
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110 | (1) |
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5.2.2 Thin-Film Formation |
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111 | (1) |
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5.2.3 Patterning Technique |
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112 | (4) |
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5.2.4 Excimer Laser Crystallization |
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116 | (4) |
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120 | (2) |
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5.4 LTPS-TFT-Driven OLED Display Design |
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122 | (21) |
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123 | (1) |
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5.4.2 Driver TFT Size Restriction |
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124 | (1) |
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5.4.3 Restriction Due to Voltage Drop |
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125 | (7) |
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5.4.4 LTPS-TFT Pixel Compensation Circuit |
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132 | (7) |
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5.4.5 Circuit Integration by LTPS-TFT |
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139 | (4) |
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6 Next-Generation OLED Technologies |
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143 | (44) |
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6.1 Color-Patterning Technologies |
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143 | (8) |
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6.1.1 White + Color Filter Patterning |
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143 | (2) |
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6.1.2 Color Conversion Medium (CCM) Patterning |
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145 | (1) |
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6.1.3 Laser-Induced Thermal Imaging (LITI) Method |
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145 | (1) |
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6.1.4 Radiation-Induced Sublimation Transfer (RIST) Method |
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146 | (2) |
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6.1.5 Dual-Plate OLED Display (DOD) Method |
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148 | (2) |
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150 | (1) |
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6.2 Solution-Processed Materials and Technologies |
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151 | (4) |
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6.3 Next-Generation OLED Manufacturing Tools |
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155 | (7) |
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6.3.1 Vapor Injection Source Technology (VIST) Deposition |
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155 | (4) |
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159 | (3) |
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6.3.3 Organic Vapor-Phase Deposition (OVPD) Method |
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162 | (1) |
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6.4 OLED Television Applications |
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162 | (13) |
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163 | (1) |
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6.4.2 High-Yield Manufacturing by White + Color Filter Method |
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164 | (11) |
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6.5 Next-Generation TFT Technologies for OLED Display |
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175 | (12) |
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6.5.1 Sequential Lateral Solidification (SLS) Method |
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175 | (1) |
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6.5.2 Microcrystalline and Superamorphous Silicon |
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176 | (2) |
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6.5.3 Solid-Phase Crystallization |
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178 | (3) |
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6.5.4 Oxide Semiconductors |
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181 | (6) |
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187 | (18) |
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7.1 Color Rendering Index |
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187 | (4) |
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7.2 OLED Lighting Requirement |
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191 | (6) |
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7.2.1 Correlated Color Temperature (CCT) |
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191 | (1) |
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192 | (5) |
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7.3 Light Extraction Enhancement |
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197 | (3) |
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7.3.1 Microlens Array Structure |
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197 | (1) |
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7.3.2 Diffusion Structure |
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198 | (2) |
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7.3.3 Diffraction Structure |
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200 | (1) |
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200 | (5) |
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7.4.1 Resistance Reduction |
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201 | (1) |
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201 | (4) |
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205 | (20) |
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205 | (10) |
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8.1.1 Flexible Display Applications |
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205 | (1) |
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8.1.2 Barrier Technology for Flexible Displays |
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205 | (3) |
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208 | (2) |
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8.1.4 Organic TFTs for Flexible Displays |
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210 | (5) |
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215 | (2) |
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217 | (8) |
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8.3.1 Passive-Matrix Tiling |
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217 | (3) |
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8.3.2 Active-Matrix Tiling |
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220 | (5) |
Appendix |
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225 | (4) |
About the Author |
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229 | (2) |
Index |
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231 | |