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Photomask and Next-Generation Lithography Mask Technology XXI [Pehme köide]

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  • Formaat: Paperback / softback, 278 pages, kõrgus x laius: 229x152 mm
  • Sari: Proceedings of SPIE
  • Ilmumisaeg: 30-Nov-2014
  • Kirjastus: SPIE Press
  • ISBN-10: 1628413239
  • ISBN-13: 9781628413236
Teised raamatud teemal:
Photomask and Next-Generation Lithography Mask Technology XXI
  • Formaat: Paperback / softback, 278 pages, kõrgus x laius: 229x152 mm
  • Sari: Proceedings of SPIE
  • Ilmumisaeg: 30-Nov-2014
  • Kirjastus: SPIE Press
  • ISBN-10: 1628413239
  • ISBN-13: 9781628413236
Teised raamatud teemal:
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.