Muutke küpsiste eelistusi

Polycrystalline Metal and Magnetic Thin Films 2000: Volume 615 [Kõva köide]

Edited by (Université d'Aix-Marseille), Edited by (Stanford University, California), Edited by (IBM T J Watson Research Center, New York), Edited by (Tulane University School of Medicine, Louisiana)
  • Formaat: Hardback, 206 pages, kõrgus x laius x paksus: 229x152x13 mm, kaal: 450 g, Worked examples or Exercises
  • Sari: MRS Proceedings
  • Ilmumisaeg: 09-Apr-2001
  • Kirjastus: Materials Research Society
  • ISBN-10: 1558995234
  • ISBN-13: 9781558995239
Teised raamatud teemal:
  • Kõva köide
  • Hind: 46,44 €*
  • * saadame teile pakkumise kasutatud raamatule, mille hind võib erineda kodulehel olevast hinnast
  • See raamat on trükist otsas, kuid me saadame teile pakkumise kasutatud raamatule.
  • Kogus:
  • Lisa ostukorvi
  • Tasuta tarne
  • Lisa soovinimekirja
  • Formaat: Hardback, 206 pages, kõrgus x laius x paksus: 229x152x13 mm, kaal: 450 g, Worked examples or Exercises
  • Sari: MRS Proceedings
  • Ilmumisaeg: 09-Apr-2001
  • Kirjastus: Materials Research Society
  • ISBN-10: 1558995234
  • ISBN-13: 9781558995239
Teised raamatud teemal:
The unprecedented growth in the semiconductor, electronics, and storage industries is the result of continued miniaturization of circuit devices, increases in chip functionality, and increased storage capacity and performance, along with a decrease in per-function cost. Hardware shrinkage has taken place leading to similar decreases in the dimensions of interconnection wires, contact metallization, and magnetic storage footprints. The important role of surfaces, interfaces, defects, and impurities has raised serious materials questions about how to control the properties of polycrystalline thin films used in applications requiring tight performance tolerances and the understanding of these, during the evolution of various film properties with time and temperature, is critical to the successful design and development of smaller devices. This book, first published in 2001, focuses on the directions taken to understand and control the properties of polycrystalline materials. Topics include: magnetic thin films and structures; polycrystalline metal films - microstructure and grain evolution and stress and mechanical properties of thin films.

Muu info

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Preface ix Materials Research Society Symposium Proceedings x MAGNETIC THIN FILMS AND STRUCTURES TEM to Support Magnetic Media Development in YR2000 3(1) Warren J. MoberlyChan Paul Dorsey Tom Nolan Michael Alex Tom Yamashita Grain Size Relationships Between the Magnetic Layer and the Underlayers in CoCrPtTa Recording Media 4(3) Kai Ma Robert Sinclair Gerardo Bertero Wei Cao Chemical Ordering and Microstructure of FePd Thin Films With Perpendicular Magnetic Anisotropy 7 B. Gilles F.F. Xu D. Halley A. Marty Y. Samson G. Patrat X-ray Probes of Magnetic Multilayer Structure 1(6) B.K. Tanner T.P.A. Hase B.D. Fulthorpe J. Clarke G.M. Luo S.K. Halder A.S.H. Rozatian S.B. Wilkins Structural Characterization of Epitaxial GMR Magnetic Multilayers and Spin Valves Grown by Sputter Deposition 7 H. Geng R. Loloee J.W. Heckman J. Bass W.P. Pratt, Jr. M.A. Crimp Spin-Dependent Electron Transport in Ferromagnet/Semiconductor Schottky Barrier Structures 4 Atsufumi Hirohata Yong-Bing Xu Christian M. Guertler J. Anthony C. Bland Stuart N. Holmes First Principles Based Solution to the Boltzmann Transport Equation for Co/Cu/Co Spin Valves 3(1) J.M. MacLaren L. Malkinski J.Q. Wang Manufacturability of GMR Heads: 10Gb/in2 and Beyond 4(3) S. Sahu Jian Chen V. Talghader S. Cool S. Mao Large Anisotropy Via Oblique Sputtering of Ta Underlayers 7 J.E. Bonevich R.D. McMichael C.G. Lee P.J. Chen W. Miller W.F. Egelhoff POLYCRYSTALLINE METAL FILMS: MICROSTRUCTURE AND GRAIN EVOLUTION Room Temperature Recrystallization of Electroplated Copper Thin Films: Methods and Mechanisms 1(1) D. Walther M.E. Gross K. Evans-Lutterodt W.L. Brown M. Oh S. Merchant P. Naresh The Effects of the Mechanical Properties of the Confinement Material on Electromigration in Metallic Interconnects 2(1) Stefan P. Hau-Riege Carl V. Thompson Microtexture and Strain in Electroplated Copper Interconnects 3(2) R. Spolenak D.L. Barr M.E. Gross K. Evans-Lutterodt W.L. Brown N. Tamura A.A. Macdowell R.S. Celestre H.A. Padmore B.C. Valek J.C. Bravman P. Flinn T. Marieb R.R. Keller B.W. Batterman J.R. Patel cterization of Cu-Al Alloy/SiO2 Interface Microstructure Pei-I. Wang 5(2) S.P. Murarka G-R. Yang E. Barnat T-M. Lu Y-C. Chen Xiang Li K. Rajan Observation of Long-Range Orientational Ordering in Metal Films Evaporated at Oblique Incidence onto Glass 7(1) David L. Everitt X.D. Zhu William J. Miller Nicholas L. Abbott Grain Boundary Curvature in Polycrystalline Metallic Thin Films 8(2) Alexander H. King Rakesh Mangat Kwame Owusu-Boahen Interfacial TiAl3 Growth: In Situ TEM Observations and Numerical Simulations 10 X. Federspiel M. Ignat L. Guettaz C. Bergman J. Phillibert A. Mack H. Fujimoto T. Marieb In Situ Electrical Resistance Measurements of Al-Ge Films in the TEM Using a Modified Heating Holder 1(4) M.A. Verheijen J.J.T.M. Donkers J.F.P. Thomassen J.J. van den Broek R.A.F. van der Rijt M.J.J. Dona C.M. Smit Electrical and Microscopic Investigation of E-Gun Evaporated Titanium Thin Films 5(1) Karl Hofmann Martina Luysberg Bernd Spangenberg Heinrich Kurz Work Function Study of Polycrystalline Metals Using a UHV Scanning Kelvin Probe 6(5) U. Petermann I.D. Baikie B. Lagel K.M. Dirscherl CVD of Thin Films of Copper and Cobalt From Different Precursors: Growth Kinetics and Microstructure 11 Anil Mane K. Shalini Anjana Devi R. Lakshmi M.S. Dharmaprakash Mandar Paranjape S.A. Shivashankar STRESS AND MECHANICAL PROPERTIES OF THIN FILMS Raman Spectroscopy: A Unique Tool for the Study of Thin Films 1(2) Ingrid De Wolf In Situ Curvature and Diffraction Studies of Pd Films on Si(001) During Solid-State Reaction 3(3) P. Gergaud O. Thomas B. Chenevier V. Ghetta A. Mouroux S.L. Zhang In Situ Stress and Strain Measurements During the Growth of Cu/Ni (001) Multilayers 6(1) T. Bigault F. Bocquet S. Labat O. Thomas A. Marty B. Gilles Structural and Elastic Response of Mo/Ni Multilayers to Ion Irradiation 7(2) Jerome Pacaud Franck Martin Anny Michel Christiane Jaouen Philippe Djemia Francois Ganot Residual Stresses and Magnetoelastic Coupling in Ultrathin Fe Films Deposited on GaAs(001) 9 P. Gergaud C. Lallaizon M. Putero B. Lepine O. Thomas A. Guivarch Changes in Stress and Microstructure in PtMn/CoFe Bilayers During Annealing 6 S.P. Bozeman B.J. Daniels D.J. Larson Author Index Subject Index