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Scanning Probe Lithography: Fundamentals, Materials, and Applications [Kõva köide]

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  • Formaat: Hardback, 128 pages, kõrgus x laius: 234x156 mm, kaal: 453 g, 17 Line drawings, black and white; 43 Halftones, black and white; 60 Illustrations, black and white
  • Sari: Emerging Materials and Technologies
  • Ilmumisaeg: 22-Dec-2022
  • Kirjastus: CRC Press
  • ISBN-10: 1032122145
  • ISBN-13: 9781032122144
Teised raamatud teemal:
Scanning Probe Lithography: Fundamentals, Materials, and ApplicationsSuurem pilt
  • Formaat: Hardback, 128 pages, kõrgus x laius: 234x156 mm, kaal: 453 g, 17 Line drawings, black and white; 43 Halftones, black and white; 60 Illustrations, black and white
  • Sari: Emerging Materials and Technologies
  • Ilmumisaeg: 22-Dec-2022
  • Kirjastus: CRC Press
  • ISBN-10: 1032122145
  • ISBN-13: 9781032122144
Teised raamatud teemal:
Püsilink: https://www.kriso.ee/db/9781032122144.html
Märksõnad:
The most complete book available on scanning probe lithography (SPL), this work details the modalities, mechanisms, and current technologies, applications, and materials on which SPL can be performed. It provides a comprehensive overview of this simple and cost-effective technique, which does not require clean room conditions and can be performed in any lab or industry facility to achieve high-resolution and high-quality patterns on a wide range of materials: biological, semiconducting, polymers, and 2D materials.

Introduces historical background of SPL, including evolution of the technique and tools

Explains the mechanism of sample modification/manipulation, types of AFM tips, technical parts of the experimental setup, and materials on which the technique can be applied

Shows the different types of devices and structures fabricated by SPL, together with the processing steps

Contains a complete and state-of-the art package of examples and different approaches, performed by different international research groups

Summarizes strengths, limitations, and potential of SPL

This book is aimed at advanced students, technicians, and researchers in materials science, microelectronics, and others working with lithographic techniques and fabrication processes.
Acknowledgements xi
Author Biographies xiii
Acronyms xv
Chapter 1 Historical Background and Place in the Lithography Roadmap
1(8)
1.1 Introduction to Nanolithography by AFM
1(1)
1.2 Historical Background
2(3)
1.3 AFM: The Most Versatile Tool at the Nanoscale
5(1)
1.4 Book Scheme
6(3)
Chapter References
7(2)
Chapter 2 Basic Concepts and Modalities
9(6)
2.1 The Tool: An Atomic Force Microscope
9(2)
2.2 An Atomic Force Microscope for Lithography
11(1)
2.3 Preparing a Scanning Probe Lithography Experiment
12(1)
2.4 "How to Name the Technique?"
13(2)
Chapter References
13(2)
Chapter 3 Mechanical Scanning Probe Lithography
15(18)
3.1 Fundamentals
15(1)
3.2 Parameters for the Lithographic Process
16(2)
3.3 Manipulation of Nano-Objects
18(2)
3.4 Cleaning of 2D Materials Post-Processing
20(2)
3.5 Applications and Proof of Concepts
22(11)
3.5.1 Lift-Off and Pattern Transfer Processes
22(1)
3.5.2 Templates
22(2)
3.5.3 Charge Modulation in Quantum Devices
24(1)
3.5.4 2D Materials Based Devices and Patterns
25(1)
3.5.5 Other Proof-of-Concept Devices and Nanostructures
26(1)
Chapter References
27(6)
Chapter 4 Dip Pen Nanolithography
33(20)
4.1 Fundamentals
33(3)
4.1.1 Type of Inks
33(1)
4.1.2 Material Transport Models
34(1)
(a) Molecular Diffusion in the Case of Diffusive Inks
34(1)
(b) Mass Fluid Flow in the Case of Liquid Inks
34(1)
4.1.3 Derivatives of Dip Pen Nanolithography Method
35(1)
4.1.4 Developments on the Tool
35(1)
4.2 Parameters for the Lithographic Process
36(3)
4.2.1 Tip
36(1)
4.2.2 Surface
37(1)
4.2.3 Ink
38(1)
4.2.4 Writing Conditions
38(1)
4.3 Electrochemical and Thermal Dip Pen Nanolithography
39(1)
4.4 Applications
40(13)
4.4.1 Etching Masks and Chemical Templates
41(2)
4.4.2 Biomolecular or Organic Molecule Patterns
43(1)
4.4.3 Inorganic Patterns
44(2)
Chapter References
46(7)
Chapter 5 Field Emission Scanning Probe Lithography
53(8)
5.1 Fundamentals
53(1)
5.2 Parameters for the Lithographic Process
53(2)
5.3 Towards Single-Digit Nanometer Lithography
55(3)
5.4 Other Processes Driven by fe-SPL
58(3)
Chapter References
59(2)
Chapter 6 Oxidation Scanning Probe Lithography
61(24)
6.1 Fundamentals
61(4)
6.1.1 Oxide Growth Kinetics
63(1)
6.1.2 Composition of the Oxides Fabricated by o-SPL
63(1)
6.1.3 Growth of Oxides over and under the Substrate Surface
64(1)
6.2 Parameters for the Lithographic Process
65(2)
6.3 Tunability of o-SPL Processes: Polarity and Atmosphere
67(1)
6.4 Applications and Proof of Concepts
68(17)
6.4.1 Lift-Off and Pattern Transfer Processes
68(1)
6.4.2 Templates
68(3)
6.4.3 Barriers for Quantum Devices
71(1)
6.4.4 Control over Metallic/Insulating State Transitions
72(1)
6.4.5 2D Materials Based Devices and Patterns
73(1)
6.4.6 Other Proof-of-Concept Devices and Nanostructures
73(2)
Chapter References
75(10)
Chapter 7 Thermal Scanning Probe Lithography
85(18)
7.1 Fundamentals and Components of the Tool
85(1)
7.2 From the Millipede to the NanoFrazor
85(4)
7.2.1 The Cantilever
86(1)
7.2.2 The Tool and the Technique
86(1)
7.2.3 The Resist
87(1)
7.2.4 Markless Lithography
88(1)
7.3 Parameters for the Lithographic Process
89(1)
7.4 Applications and Proof of Concepts
90(13)
7.4.1 Lift-Off and Pattern Transfer Processes
90(1)
7.4.2 Etching Masks and Templates
90(3)
7.4.3 Three-Dimensional Structures
93(2)
7.4.4 2D Materials
95(1)
7.4.5 Physical and Chemical Conversion
96(1)
Chapter References
97(6)
Chapter 8 Lithography Using a Scanning Tunneling Microscope
103(12)
8.1 Fundamentals and Parameters
103(1)
8.2 Manipulation of Atoms and Molecules
104(6)
8.2.1 Parallel Processes
104(2)
8.2.2 Perpendicular Processes
106(1)
8.2.3 Hydrogen Depassivation Lithography and Atomically Precise Manufacturing
107(3)
8.3 Scanning Proximal Probe Lithography
110(5)
Chapter References
110(5)
Chapter 9 High-Throughput Strategies
115(10)
9.1 Array of Cantilevers
115(1)
9.2 Soft/Hard Stamps
116(4)
9.3 Mix and Match Lithography
120(5)
Chapter References
120(5)
Index 125
Dr. Yu Kyoung Ryu is a postdoctoral researcher at Instituto de Sistemas Optoelectrónicos y Microtecnología (Universidad Politécnica de Madrid). She received a Physics degree from Universidad Complutense de Madrid and PhD from Instituto de Ciencia de Materiales de Madrid (ICMM, CSIC), under the supervision of Prof. Ricardo Garcia. She did a postdoctoral stay at IBM Research Zurich in the group of Dr. Armin Knoll (20162017) and a postdoctoral stay at ICMM (CSIC) in the group of Dr. Andrés Castellanos-Gomez (20192020). She has published 21 peer-reviewed articles in international journals (including ACS Nano, Nano Letters, Physical Review Letters, 2D Materials) and 3 book chapters.

Prof. Javier Martinez Rodrigo is Vice Principal of the Instituto de Sistemas Optoelectrónicos y Microtecnología (ISOM) at Universidad Politécnica de Madrid (UPM) and coordinator of the ICTS Clean Rooms network for Micro and Nanofabrication MICRONANOFABs (www.micronanofabs.org). He achieved the PhD degree in Physics in 2002 and also an Electronic Engineering degree from Universidad de Valladolid. He worked as postdoctoral researcher at the Lawrence Berkeley National Laboratory (USA) in 2003 and later he was appointed as CSIC researcher at the Madrid Institute of Microelectronics, where his main topic was the fabrication of devices and the development of high-throughput strategies based on oxidation scanning probe lithography. In 2011 he became I3 Professor at UPM. His research interest is focused in the development of nanoelectronic devices fabricated with graphene or other 2D materials for energy applications. He has published more than 30 peer-reviewed articles in international journals (including Nature Nanotechnology, Advanced Materials, Nano Letters) and 1 book chapter. He holds 2 patents.