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Silicon Carbide 2004 Materials, Processing and Devices: Volume 815 [Pehme köide]

Edited by (University of South Florida), Edited by (Stony Brook University, State University of New York), Edited by (Kyoto University, Japan), Edited by , Edited by (Stony Brook University, State University of New York)
  • Formaat: Paperback / softback, 340 pages, kõrgus x laius x paksus: 229x152x18 mm, kaal: 460 g
  • Sari: MRS Proceedings
  • Ilmumisaeg: 05-Jun-2014
  • Kirjastus: Cambridge University Press
  • ISBN-10: 1107409209
  • ISBN-13: 9781107409200
Teised raamatud teemal:
  • Pehme köide
  • Hind: 41,04 €*
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  • Lisa ostukorvi
  • Tasuta tarne
  • Lisa soovinimekirja
  • Formaat: Paperback / softback, 340 pages, kõrgus x laius x paksus: 229x152x18 mm, kaal: 460 g
  • Sari: MRS Proceedings
  • Ilmumisaeg: 05-Jun-2014
  • Kirjastus: Cambridge University Press
  • ISBN-10: 1107409209
  • ISBN-13: 9781107409200
Teised raamatud teemal:
Silicon carbide (SiC) is a wide-bandgap semiconductor that can operate at temperatures well above 300ºC, where silicon cannot perform. In addition, due to a high thermal conductivity equal to copper at room temperature, SiC is an ideal candidate for operation in harsh environments and at high-power levels. Rapid advances in SiC materials and devices have recently resulted in implementation of SiC-based electronic systems, and the impact of these devices is expected to significantly increase in the next several years. This book documents the most recent results on growth of bulk and epitaxial layers, physical and structural properties, process technology, and device development obtained since the 10th International Conference on Silicon Carbide and Related Materials 2003 (ICSCRM2003) held in Lyon, France. Extended defects in silicon carbide are highlighted. The nature of defects induced by forward biasing of bipolar devices, as well as methods to suppress the degradation, are addressed.

Muu info

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.