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Teach Yourself the Basics of Aspen Plus [Pehme köide]

  • Formaat: Paperback / softback, 232 pages, kõrgus x laius x paksus: 254x178x13 mm, kaal: 436 g, Illustrations, Contains 1 CD-ROM
  • Ilmumisaeg: 15-Feb-2011
  • Kirjastus: Wiley-Blackwell
  • ISBN-10: 0470567953
  • ISBN-13: 9780470567951
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Teach Yourself the Basics of Aspen PlusSuurem pilt
  • Formaat: Paperback / softback, 232 pages, kõrgus x laius x paksus: 254x178x13 mm, kaal: 436 g, Illustrations, Contains 1 CD-ROM
  • Ilmumisaeg: 15-Feb-2011
  • Kirjastus: Wiley-Blackwell
  • ISBN-10: 0470567953
  • ISBN-13: 9780470567951
Teised raamatud teemal:
Püsilink: https://www.kriso.ee/db/9780470567951.html
Märksõnad:
Aspen Plus is on of the most popular process simulation software programs used industrially and academically. Though the software is available at many corporations and universities, there are no textbooks which are dedicated to teaching the step-by-step use of the software. This book is designed to fill that need. The structure of the book is unique in that it emulates a lecture /workshop classroom environment.

Each chapter starts with the equivalent of a classroom lecture followed by workshops which provide experience in the chapter's subject matter. The enclosed CD contains solutions, both in Aspen Plus and text formats, to examples imbedded in the text as well as to all the workshops. There are also notes at the end of each chapter designed to aid readers that have difficulty with the workshops.

Note: CD-ROM/DVD and other supplementary materials are not included as part of eBook file.

Arvustused

"Intended for graduate students in chemical engineering, this guide to the Aspen Plus process modeling software tool provides practical instruction for getting started with this useful simulation tool." (Booknews, 1 April 2011)

Preface xiii
1 Introduction To Aspen Plus 1(20)
1.1 Starting Aspen Plus
2(1)
1.2 Graphic Users Interface
3(1)
1.3 Next Button
4(1)
1.4 Setup Specifications Display
5(1)
1.5 Simulation Options
6(1)
1.6 Units
6(2)
1.7 Components
8(2)
1.8 Properties
10(2)
1.9 Streams
12(2)
1.10 Blocks
14(1)
1.11 Viewing Results
14(2)
1.12 Object Manager
16(1)
1.13 Plotting Results
17(2)
References
19(2)
2 Properties 21(16)
2.1 Pure Component Data Banks
21(3)
2.2 Property Analysis
24(1)
2.3 Property Estimation
25(9)
2.4 Workshops
34(1)
References
35(2)
3 The Simple Blocks 37(12)
3.1 Mixer/Splitter Blocks
37(2)
3.1.1 Mixer Block
37(1)
3.1.2 Fsplit Block
38(1)
3.2 Simple Separator Blocks
39(3)
3.2.1 Sep Block
40(1)
3.2.2 Sep2 Block
41(1)
3.3 Some Manipulator Blocks
42(3)
3.3.1 Dupl Block
42(2)
3.3.2 Mult Block
44(1)
3.4 Workshops
45(4)
4 Processes With Recycle 49(10)
4.1 Blocks with Recycle
50(3)
4.2 Heuristics
53(1)
4.3 Workshops
54(4)
References
58(1)
5 Flowsheeting And Model Analysis Tools 59(14)
5.1 Introduction to Fortran in Aspen Plus
59(1)
5.2 Basic Interpreted Fortran Capabilities
60(3)
5.2.1 Primary Fortran Operators
61(1)
5.2.2 Precedence of Calculations
61(1)
5.2.3 Statement Format
62(1)
5.2.4 Program Logic Control
62(1)
5.3 Sensitivity Function
63(2)
5.4 Design Specification
65(2)
5.5 Calculator Function
67(2)
5.6 Transfer Function
69(2)
5.7 Workshops
71(1)
References
72(1)
6 The Data Regression System 73(20)
6.1 Parameters of Equations of State
74(2)
6.2 Parameters of Activity Coefficient Equations
76(1)
6.3 Basic Ideas of Regression
77(3)
6.4 Mathematics of Regression
80(2)
6.4.1 Newton—Raphson Method for Solution of Nonlinear Equations
80(1)
6.4.2 Direct Optimization of an Objective Function
81(1)
6.5 Practical Aspects of Regression of VLE or LLE Data
82(5)
6.5.1 Regression of VLE Data
82(3)
6.5.2 Regression of LLE Data
85(2)
6.6 Workshops
87(3)
References
90(3)
7 Flashes And Decanter 93(12)
7.1 Flash2 Block
93(3)
7.2 Flash3 Block
96(3)
7.3 Decanter Block
99(2)
7.4 Workshops
101(2)
References
103(2)
8 Pressure Changers 105(6)
8.1 Pump Block
105(1)
8.2 Compr Block
105(2)
8.3 MCompr Block
107(1)
8.4 Pipelines and Fittings
107(2)
8.5 Workshops
109(1)
Reference
110(1)
9 Heat Exchangers 111(12)
9.1 Heater Block
112(3)
9.2 Heatx Block
115(3)
9.3 Mheatx Block
118(1)
9.4 Workshops
118(3)
References
121(2)
10 Reactors 123(22)
10.1 RStoic Block
123(2)
10.2 RYield Block
125(1)
10.3 REquil Block
126(2)
10.4 RGibbs Block
128(1)
10.5 Reactions for the Rigorous Models
129(5)
10.5.1 Equilibrium Class
130(1)
10.5.2 Powerlaw Class
130(3)
10.5.3 Langmuir—Hinshelwood—Hougen—Watson Class
133(1)
10.5.4 Generalized–Langmuir–Hinshelwood–Hougen–Watson Class
134(1)
10.6 RCSTR Block
134(1)
10.7 RPlug Block
135(3)
10.8 RBatch Block
138(1)
10.9 Workshops
139(5)
References
144(1)
11 Multistage Equilibrium Separators 145(30)
11.1 Basic Equations
145(3)
11.2 The Design Problem
148(2)
11.3 A Three-Product Distillation Example
150(4)
11.4 Preliminary Design and Rating Models
154(3)
11.4.1 DSTWU
154(2)
11.4.2 Distl
156(1)
11.5 Rigorous Models
157(10)
11.5.1 RadFrac
158(6)
11.5.2 Extract
164(3)
11.6 BatchSep
167(3)
11.7 Workshops
170(3)
References
173(2)
12 Process Flowsheet Development 175(16)
12.1 Heuristics
175(1)
12.2 Example: The Production of Styrene
176(1)
12.3 A Model with Basic Blocks
177(1)
12.4 Properties
177(1)
12.5 Rigorous Flash and Decanter
178(3)
12.6 Analyzing the Rigorous Distillation
181(1)
12.7 Integrating the Rigorous Distillation Into the Flowsheet
181(2)
12.7.1 Selection of a Tear Stream
183(1)
12.7.2 Sequence of Calculations
183(1)
12.8 Reactor Feed
183(2)
12.9 Miscellaneous Considerations
185(1)
12.10 Workshops
185(4)
Reference
189(2)
13 Optimization 191(8)
13.1 Optimization Example
192(3)
13.2 Workshops
195(3)
References
198(1)
14 Complex Equilibrium Stage Separations 199(14)
14.1 Energy Integration Applications
199(3)
14.2 Homogeneous Azeotropic Distillation
202(1)
14.3 Extractive Distillation
203(2)
14.4 Heterogeneous Operations
205(2)
14.5 Workshops
207(4)
References
211(2)
Index 213
RALPH SCHEFFLAN has been an Adjunct Professor at Stevens Institute of Technology (SIT) for the past twenty-nine years. He has taught four graduate courses-thermodynamics, process simulation, numerical methods, and equilibrium stage operations-during his time there, as well as being SIT's representative to Aspen Technology. Dr. Schefflan introduced process simulation at SIT evolving from Flowtran to Aspen Plus. In his twenty-two years at Hoffmann-LaRoche he also introduced process simulation and was a founding member of the Flowtran Users Group.