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Understanding Surface and Thin Film Science [Kõva köide]

(University of Colorado at Colorado Springs, USA)
  • Formaat: Hardback, 356 pages, kõrgus x laius: 254x178 mm, kaal: 453 g, 21 Tables, black and white; 387 Line drawings, black and white; 7 Halftones, black and white; 394 Illustrations, black and white
  • Ilmumisaeg: 08-Dec-2022
  • Kirjastus: CRC Press Inc
  • ISBN-10: 1482233037
  • ISBN-13: 9781482233032
Teised raamatud teemal:
Understanding Surface and Thin Film ScienceSuurem pilt
  • Formaat: Hardback, 356 pages, kõrgus x laius: 254x178 mm, kaal: 453 g, 21 Tables, black and white; 387 Line drawings, black and white; 7 Halftones, black and white; 394 Illustrations, black and white
  • Ilmumisaeg: 08-Dec-2022
  • Kirjastus: CRC Press Inc
  • ISBN-10: 1482233037
  • ISBN-13: 9781482233032
Teised raamatud teemal:
Püsilink: https://www.kriso.ee/db/9781482233032.html
Märksõnad:
This book is a conceptual overview of surface and thin film science, providing a basic and straightforward understanding of the most common ideas and methods used in these fields. Fundamental scientific ideas, deposition methods, and characterization methods are all examined.

Relying on simple, conceptual models and figures, fundamental scientific ideas are introduced and then applied to surfaces and thin films in the first half of the book. Topics include vacuum and plasma environments, crystal structure, atomic motion, thermodynamics, electrical and magnetic properties, optical and thermal properties, and adsorbed atoms on surfaces. Common methods of gas-phase thin film deposition are then introduced, starting with an overview of the film growth process and then a discussion of both physical and chemical vapor deposition methods. This is followed by an overview of a wide range of characterization techniques including imaging, structural, chemical, electrical, magnetic, optical, thermal, and mechanical techniques.



Thin film science is a natural extension of surface science, especially as applications involve thinner and thinner films; distinct from other literature in the field, this book combines the two topics in a single volume. Simple, conceptual models and figures are used, supported by some mathematical expressions, to convey key ideas to students as well as practicing engineers, scientists, and technicians.
Preface xiii
Author xv
1 Surfaces and Thin Films
1(8)
1.1 Introduction
1(3)
1.2 Atomic Scale Models
4(2)
1.3 Overview
6(3)
References
8(1)
2 Vacuum and Plasma Environments
9(26)
2.1 Kinetic Theory of Gases
9(8)
2.1.1 Ideal Gas Law
9(1)
2.1.2 Pressure and Vacuum
10(1)
2.1.3 Interactions in the Gas
10(5)
2.1.4 Interactions with Surfaces
15(1)
2.1.5 Vapor Pressure
16(1)
2.1.6 Gases vs. Solids
16(1)
2.2 Plasmas
17(10)
2.2.1 Creating a Plasma
17(3)
2.2.2 Characterizing a Plasma
20(1)
2.2.3 Motion of Charges
21(3)
2.2.4 Plasma Sources
24(1)
2.2.5 Chemistry in Plasmas
25(1)
2.2.6 Applications of Plasmas
26(1)
2.3 Cleaning Surfaces
27(8)
References
29(1)
Problems
30(5)
Part I Surfaces
3 Crystal Structure
35(24)
3.1 Structure of Crystals
35(8)
3.2 Reciprocal Lattice
43(1)
3.3 Bonds in Crystals
44(2)
3.4 Defects in Crystals
46(3)
3.5 Ideal Surfaces
49(1)
3.6 Surface Reconstructions
50(2)
3.7 Minimizing Energy
52(1)
3.8 Surface Roughness
53(1)
3.9 Non-Crystalline (Amorphous) Solids
54(1)
3.10 Characterization of Structure
54(5)
References
55(1)
Problems
55(4)
4 Atomic Motion: Vibrations, Waves, and Diffusion in Solids
59(22)
4.1 Thermal Vibrations
59(2)
4.2 Elastic Waves and Phonons
61(7)
4.2.1 Elastic Waves
61(4)
4.2.2 Phonons
65(1)
4.2.3 Surface Waves and Phonons
66(2)
4.3 Diffusion
68(8)
4.3.1 Bulk Diffusion
68(5)
4.3.2 Surface and Interface Diffusion
73(1)
4.3.3 Surface Roughness
74(2)
4.4 Characterization of Atomic Motion
76(5)
References
76(1)
Problems
76(5)
5 Thermodynamics
81(18)
5.1 Thermodynamics in Solids
82(3)
5.2 Phase Diagrams
85(4)
5.2.1 One-Component Systems
85(2)
5.2.2 Two-Component Systems
87(1)
5.2.3 Binary Solid Solutions
87(1)
5.2.4 Binary Eutectics
88(1)
5.2.5 Other Considerations
89(1)
5.3 Surface Thermodynamics
89(5)
5.3.1 Surface Energy, Tension, and Stress
89(2)
5.3.2 Minimizing Energy
91(2)
5.3.3 Segregation in Two-Component Systems
93(1)
5.4 Characterization of Thermodynamics
94(5)
References
95(1)
Problems
95(4)
6 Electrical, Magnetic, Optical, and Thermal Properties
99(36)
6.1 Electrical Properties
99(15)
6.1.1 Free Electron Gas Model
99(2)
6.1.2 Jellium and Nearly Free Electron Model
101(2)
6.1.3 Other Electronic Models
103(2)
6.1.4 Semiconductors
105(1)
6.1.5 Resistivity and Conductivity
106(1)
6.1.6 Surfaces
107(3)
6.1.7 Surface States
110(2)
6.1.8 Excitons and Plasmons
112(2)
6.2 Magnetic Properties
114(5)
6.2.1 Magnetic Materials
114(3)
6.2.2 Ferromagnetic Energies
117(1)
6.2.3 Surface Magnetism
118(1)
6.3 Optical Properties
119(8)
6.3.1 Electromagnetic Waves in Materials
119(3)
6.3.2 Optical Properties at Surfaces
122(1)
6.3.3 Adsorbates on Surfaces
123(1)
6.3.4 Films
124(3)
6.4 Thermal Properties
127(2)
6.4.1 Specific Heat
128(1)
6.4.2 Thermal Conductivity
128(1)
6.4.3 Thermal Expansion
128(1)
6.5 Characterization of Surface and Film Properties
129(6)
References
129(1)
Problems
130(5)
7 Adsorbed Atoms on Surfaces
135(16)
7.1 Thermodynamics of Adsorbed Atoms
135(4)
7.2 Ordered Structures
139(5)
7.3 Molecular Adsorption
144(1)
7.4 Adsorbate Motions
145(2)
7.5 Characterization of Adsorbed Atoms
147(4)
References
147(1)
Problems
147(4)
Part II Thin Films
8 Overview of Thin Film Growth
151(28)
8.1 Introduction
151(1)
8.2 Homogeneous Nucleation and Growth
152(6)
8.3 Steps in Film Formation
158(15)
8.3.1 Thermal Accommodation
158(1)
8.3.2 Binding and Desorption
159(1)
8.3.3 Surface Diffusion
160(1)
8.3.4 Heterogeneous Nucleation
161(6)
8.3.5 Island Growth
167(2)
8.3.6 Island Coalescence
169(1)
8.3.7 Thicker Films Zone Models
170(3)
8.4 Deviations from Non-Ideal Structure
173(1)
8.5 Advanced Modelling
174(1)
8.6 Summary and Characterization of Thin Films
175(4)
References
175(1)
Problems
176(3)
9 Physical Vapor Deposition
179(30)
9.1 Evaporation
179(9)
9.1.1 Source
179(1)
9.1.2 Transport
180(3)
9.1.3 Deposition
183(3)
9.1.4 Evaporation Parameters and Processes
186(2)
9.2 Sputter Deposition
188(8)
9.2.1 Source
188(2)
9.2.2 Transport
190(1)
9.2.3 Deposition
191(1)
9.2.4 DC (Diode) Sputter Deposition
192(2)
9.2.5 RF Sputter Deposition
194(1)
9.2.6 Magnetron Sputter Deposition
195(1)
9.3 Modifications to Physical Vapor Deposition
196(1)
9.3.1 Ion-Assisted Deposition
196(1)
9.3.2 Reactive Deposition
196(1)
9.3.3 Comparison of Evaporation and Sputtering
197(1)
9.4 Molecular Beam Epitaxy and Epitaxial Films
197(3)
9.5 Arc Vaporization Cathodic Arc Deposition
200(1)
9.5.1 Source
200(1)
9.5.2 Transport
200(1)
9.5.3 Deposition
201(1)
9.6 Pulsed Laser Deposition Laser Ablation
201(8)
9.6.1 Source
201(1)
9.6.2 Transport
202(1)
9.6.3 Deposition
202(1)
References
203(1)
Problems
203(6)
10 Chemical Vapor Deposition
209(18)
10.1 Overview and Chemical Reactions
209(4)
10.2 Source
213(1)
10.3 Transport
213(2)
10.4 Deposition
215(3)
10.5 Modifications of CVD
218(4)
10.5.1 Low-Pressure CVD
218(1)
10.5.2 Plasma Enhanced CVD
219(1)
10.5.3 Laser Enhanced CVD
220(1)
10.5.4 Hot Wire CVD
220(1)
10.5.5 Metalorganic CVD
221(1)
10.6 Atomic Layer Deposition
222(5)
References
223(1)
Problems
224(3)
Part III Characterization of Surfaces and Thin Films
11 Characterization: Overview and Imaging Techniques
227(22)
11.1 Overview of Characterization
227(2)
11.2 Imaging Techniques
229(20)
11.2.1 Optical Microscopes
229(3)
11.2.2 Scanning Electron Microscope
232(5)
11.2.3 Transmission Electron Microscope
237(2)
11.2.4 Low Energy Electron Microscope
239(1)
11.2.5 Scanning Probe Microscopes
240(6)
References
246(1)
Problems
247(2)
12 Characterization: Structural Techniques
249(24)
12.1 X-Ray Diffraction
249(7)
12.2 Low Energy Electron Diffraction
256(6)
12.3 Reflection High Energy Electron Diffraction
262(1)
12.4 X-Ray Reflectivity
263(2)
12.5 Scattering Techniques
265(1)
12.6 Stylus Profilometer
266(2)
12.7 Quartz Crystal Microbalance
268(2)
12.8 Film Density Measurements
270(3)
References
270(1)
Problems
271(2)
13 Characterization: Chemical and Elemental Techniques
273(30)
13.1 Auger Electron Spectroscopy
273(7)
13.2 Energy and Wavelength Dispersive X-Ray Analysis
280(1)
13.3 X-Ray Photoelectron Spectroscopy
281(5)
13.4 Ultraviolet Photoelectron Spectroscopy
286(1)
13.5 Near-Edge X-Ray Absorption Fine Structure
287(1)
13.6 Secondary Ion Mass Spectrometry
288(2)
13.7 Scattering Techniques
290(2)
13.8 Fourier Transform Infrared Spectroscopy
292(3)
13.9 Raman Spectroscopy
295(1)
13.10 Electron Energy Loss Spectroscopy
296(7)
References
299(1)
Problems
300(3)
14 Characterization: Electrical, Magnetic, and Optical Techniques
303(24)
14.1 Electrical Characterization
303(4)
14.1.1 Hall Effect
303(1)
14.1.2 Resistivity: Four-Point Probe
304(3)
14.2 Magnetic Characterization
307(7)
14.2.1 Magneto-Optical Kerr Effect
307(1)
14.2.2 Spin-Polarized Electron Techniques
308(1)
14.2.3 Magnetic Force Microscopy
309(1)
14.2.4 Brillouin Light Scattering
310(1)
14.2.5 Magnetometers
311(1)
14.2.6 Ferromagnetic Resonance
312(1)
14.2.7 X-Ray Magnetic Circular Dichroism
313(1)
14.3 Optical Characterization
314(13)
14.3.1 Reflectance
315(2)
14.3.2 Ellipsometry
317(4)
14.3.3 Light Scattering
321(1)
14.3.4 Interferometry
322(2)
References
324(1)
Problems
324(3)
15 Characterization: Thermodynamic, Thermal, and Mechanical Techniques
327(18)
15.1 Thermodynamic Characterization
327(6)
15.1.1 Surface Tension
327(1)
15.1.2 Surface Adsorption and Desorption
328(3)
15.1.3 Differential Scanning Calorimetry and Thermogravimetric Analysis
331(1)
15.1.4 Diffusion
332(1)
15.2 Thermal Characterization
333(2)
15.2.1 Micro-Thermal Microscopy
333(1)
15.2.2 Photothermal Analysis
334(1)
15.2.3 Cross-Plane Thermal Analysis
334(1)
15.3 Mechanical Characterization
335(10)
15.3.1 Brillouin Light Scattering
335(1)
15.3.2 Stress
335(2)
15.3.3 Friction
337(1)
15.3.4 Microindentation Nano-indentation
338(1)
15.3.5 Adhesion
339(4)
References
343(1)
Problems
343(2)
Appendix 1 Physical Constants and Unit Conversions 345(2)
Appendix 2 Acronyms and Abbreviations 347(2)
Appendix 3 Basic Vacuum Technology 349(4)
Index 353
Tom Christensen joined the faculty of the University of Colorado - Colorado Springs (UCCS) Department of Physics and Energy Science in 1989. He served the campus as a faculty member, department chair, associate dean, dean and Provost. He co-directed the UCCSTeach program for preparing future secondary science and math teachers. Dr. Christensen received both the College (1993) and campus (1996) Outstanding Teaching Awards, the Chancellors Award (2003) to recognize his service and teaching, and the University of Colorado Excellence in Leadership Award (2015). Tom received his B.S. degrees in Physics and Astrophysics from the University of Minnesota and his Ph.D. in Applied Physics from Cornell University. He was a Member of the Technical Staff at Sandia National Labs prior to joining the UCCS faculty. Dr. Christensens research in experimental surface physics has led to many published papers in international science journals and presentations at scientific meetings. He has been the principal or co-principal investigator on over $2 million in research grants and contracts for work in surface physics and in science education. He taught 25 different classes at UCCS at all levels from introductory classes for non-majors to graduate level classes. He has served his primary professional society (AVS) on national Education and Diversity committees. In his spare time, Tom plays string bass with the Pikes Peak Philharmonic orchestra and bass guitar with the Physics Classic Rock and Roll Orchestra.