Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Arvustused
"With the accelerating pace of research and development in so many areas of microscopy, keeping abreast of the widespread literature is becoming increasingly time-consuming. In Advances in Optical & Electron Microscopy the Editors are to be congratulated on bringing together in a convenient and comprehensible form a variety of topics of current interest." --J.A. Chapman in LABORATORY PRACTICE
Chapter I: Basic Field Equations
Chapter II: Reducible Systems
Chapter III: Basic Mathematical Tools
Chapter IV: The Finite-Difference Method (FDM)
Chapter V: The Finite-Element Method (FEM)
Chapter VI: The Boundary Element Method
Chapter VII: Hybrid Methods
Appendix
Index
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.
