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Advances in Imaging and Electron Physics, Volume 203 [Kõva köide]

Series edited by (Founder-President of the European Microscopy Society and Fellow, Microscopy and Optical Societies of America; member of the editorial boards of several microscopy journals and Serial Editor, Advances in Electron Optics, France)
  • Formaat: Hardback, 212 pages, kõrgus x laius: 229x152 mm, kaal: 520 g
  • Sari: Advances in Imaging and Electron Physics
  • Ilmumisaeg: 22-Sep-2017
  • Kirjastus: Academic Press Inc
  • ISBN-10: 0128120878
  • ISBN-13: 9780128120873
Teised raamatud teemal:
Advances in Imaging and Electron Physics, Volume 203Suurem pilt
  • Formaat: Hardback, 212 pages, kõrgus x laius: 229x152 mm, kaal: 520 g
  • Sari: Advances in Imaging and Electron Physics
  • Ilmumisaeg: 22-Sep-2017
  • Kirjastus: Academic Press Inc
  • ISBN-10: 0128120878
  • ISBN-13: 9780128120873
Teised raamatud teemal:
Püsilink: https://www.kriso.ee/db/9780128120873.html
Märksõnad:

Advances in Imaging and Electron Physics, Volume 203, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. It features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

  • Contains contributions from leading authorities on the subject matter
  • Informs and updates on all the latest developments in the field of imaging and electron physics
  • Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electron, and ion emission with a valuable resource
  • Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing

Muu info

Cutting-edge articles on the latest developments in all areas of microscopy, image science, and many related subjects in electron physics
Contributors ix
Preface xi
Future Contributions xiii
1 Convolution in (max, min)-Algebra and Its Role in Mathematical Morphology 1(66)
Jesus Angulo
1 Introduction
2(3)
2 Basic Notions and Notations
5(5)
3 (max, min)-Convolutions: Definition and Properties
10(17)
3.1 Definition
10(1)
3.2 Duality by Complement vs. Duality by Adjunction
11(3)
3.3 Commutation with Level Set Processing
14(4)
3.4 Further Properties
18(4)
3.5 Openings, Closings Using (max, min)-Convolutions and Granulometries
22(5)
4 Hopf-Lax-Oleinik Formulas for Hamilton-Jacobi Equation ut plus or minus H(u, Du) = 0
27(6)
4.1 Morphological PDE for Classical Dilation and Erosion
27(1)
4.2 Viscosity Solution of Hamilton-Jacobi Equation with Hamiltonians Containing u and Du
28(5)
5 Nonlinear Analysis Using Operators
33(11)
5.1 Quasi-Concavity
33(2)
5.2 Lipschitz Approximation
35(4)
5.3 A Transform in (max, min)-Convolution
39(5)
6 Ubiquity of (max, min)-Convolutions in Mathematical Morphology
44(16)
6.1 Distance Function
44(1)
6.2 Flat Morphological Operators Using Indicator Functions
45(1)
6.3 Links with Fuzzy Morphology
46(2)
6.4 Links with Viscous Morphology
48(3)
6.5 Links with Boolean Random Function Characterization
51(7)
6.6 Links with Geodesic Dilation and Erosion
58(2)
7 Conclusion and Perspectives
60(3)
Acknowledgment
63(1)
References
63(4)
2 Critical Magnetic Field and Its Slope, Specific Heat, and Gap for Superconductivity as Modified by Nanoscopic Disorder 67(32)
Clifford M. Krowne
1 Introduction
67(6)
2 Relevant Statistical Energies to Use for Finding Critical Magnetic Field, Heat Capacity, and Other Parameters
73(1)
3 Energy Dispersion Relation Obtained from a Bogoliubov Transformation on a Mean Field BCS Hamiltonian
74(5)
4 Averaged Energy E to Be Used in the Free Energy Construction
79(2)
5 Microscopically Determined Entropy S
81(1)
6 Evaluating the Microscopic Entropy S
82(2)
7 Evaluating the Averaged Energy E
84(2)
8 Critical Magnetic Field from Microscopic Approach
86(2)
9 Specific Heat of Electrons for the System
88(1)
10 Slope of the Critical Magnetic Field at the Critical Temperature
89(1)
11 Relating the Disorder Potential Energy to the Gap Parameter
90(4)
12 Conclusions
94(1)
Acknowledgments
94(1)
References
94(5)
3 Mirror Electron Microscopy 99(63)
A.B. Bok
J.B. le Poole
J. Roos
H. de Lang
1 Introduction
100(5)
1.1 Scanning Electron Microscope
100(1)
1.2 Emission Electron Microscope
101(1)
1.3 Reflection Electron Microscope
101(1)
1.4 Mirror Electron Microscope
101(4)
2 Contrast Formation in a Mirror Electron Microscope with Focused Images
105(41)
2.1 Principle
105(1)
2.2 Calculations
106(3)
2.3 Model A
109(12)
2.4 Model B (Solution of the Exact Equations of Motion 2.1a and b)
121(6)
2.5 Model C
127(11)
2.6 Comparison with the Image Contrast for a Mirror Projection Microscope
138(5)
2.7 Magnetic Contrast
143(2)
2.8 Concise List of Symbols Used in Section 2
145(1)
3 Description and Design op a Mirror Electron Microscope with Focused Images
146(9)
3.1 Description
146(9)
4 Results and Applications
155(7)
4.1 Results
155(5)
4.2 Applications
160(2)
Appendix A: A Scanning Mirror Electron Microscope with Magnetic Quadrupoles (Bok et al., 1964) 162(4)
Appendix B: Calculation of the Influence of the Specimen Perturbation on the Phase of the Reflected Electron Beam in a Mirror Electron Microscope 166(5)
Appendix C: Practice of Mirror Electron Microscopy 171(11)
Appendix D: Shadow Projection Mirror Electron Microscopy in "Straight" Systems 182(8)
References 190(3)
Index 193
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.