Advances in Imaging and Electron Physics, Volume 205 is the latest release in this series that merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
- Contains contributions from leading authorities on the subject matter
- Informs and updates on all the latest developments in the field of imaging and electron physics
- Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electrons and ion emission with a valuable resource
- Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing
| Contributors |
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vii | |
| Preface |
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ix | |
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1 The Early Electron Microscopes: A Critical Study |
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1 | (138) |
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Part 1 Conceiving the Idea |
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2 | (1) |
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1 Ernst Ruska, Max Knoll and the Technische Hochschule |
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3 | (23) |
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2 Ernst Bruche and the AEG Research Institute |
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26 | (7) |
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3 Reinhold Rudenberg and Siemens |
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33 | (18) |
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51 | (2) |
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5 Electron Optics in the USA and Great Britain |
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53 | (3) |
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6 Conceiving the Idea: Summary and Conclusion |
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56 | (7) |
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Part 2 Materialising the Idea |
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62 | (1) |
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63 | (35) |
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98 | (13) |
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111 | (3) |
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114 | (3) |
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117 | (2) |
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12 Materialising the Idea: Summary and Conclusion |
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119 | (20) |
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Appendix A Siemens Patent List |
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126 | (2) |
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Appendix B Postscript: A Tribute to John van Gorkom by Dirk van Delft and Ton van Helvoort |
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128 | (4) |
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132 | (7) |
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2 Electron Optics of Low-Voltage Electron Beam Testing and Inspection. Part I: Simulation Tools |
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139 | (130) |
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139 | (1) |
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140 | (4) |
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2 Calculating Electrostatic and Magnetic Fields |
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144 | (49) |
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193 | (45) |
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4 Coulomb Interaction and Electrostatic Charging |
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238 | (17) |
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5 Summary and Future Outlook |
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255 | (14) |
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257 | (1) |
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257 | (12) |
| Index |
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269 | |
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.
