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Fabrication of Silicon Microprobes for Optical Near-Field Applications [Kõva köide]

(Tohoku University, Sendai, Japan), (Tohoku University, Japan), (Tohoku University, Japan)
  • Formaat: Hardback, 192 pages, kõrgus x laius: 234x156 mm, kaal: 408 g, 130 Illustrations, black and white
  • Ilmumisaeg: 15-Jan-2002
  • Kirjastus: CRC Press Inc
  • ISBN-10: 0849311543
  • ISBN-13: 9780849311543
Teised raamatud teemal:
  • Formaat: Hardback, 192 pages, kõrgus x laius: 234x156 mm, kaal: 408 g, 130 Illustrations, black and white
  • Ilmumisaeg: 15-Jan-2002
  • Kirjastus: CRC Press Inc
  • ISBN-10: 0849311543
  • ISBN-13: 9780849311543
Teised raamatud teemal:
The development of near-field optics marked a major advance in microscopy and our ability to develop nanoscale technologies. However, the tapered optical fiber widely in use as the optical near-field probe has serious limitations in its fabrication, its optical transmission efficiency, and its use in arrays.

Fabrication of Silicon Microprobes for Optical Near-Field Applications reports on several technological approaches to using silicon micromachining techniques for fabricating microprobes without the drawbacks of conventional optical fiber probes. The authors have developed a simple, effective method for batch-process production of silicon cantilevered probes with apertures as small as 20 nanometers. They have investigated in detail the probes' optical performance characteristics and show how the silicon probes overcome the limitations of the optical fiber probes in terms of production throughput, optical throughput, reproducibility, simplicity of instrumentation, and mechanical performance.

Arvustused

"All in all, I found this book interesting, well organized, and easy to understand. Written crisply and to the point, it satisfyingly balances mathematical method with experimental results."

Pouria Valley, University of Arizona, in IEEE Circuits & Devices Magazine, July/August 2006, Vol. 22, No. 4

Introduction
1(6)
Introduction
1(2)
Structure of the book
3(4)
References
4(3)
Part 1: Backgrounds
Introduction to near-field optics
7(24)
Far-field light and diffraction effect
7(5)
Concept of near-field optics and optical near-field microscopy
12(5)
Instrumentation of optical near-field imaging
17(2)
Techniques for control of the tip-sample distance
19(3)
Tapered optical fiber-based optical near-field probes
22(3)
Advantages of Si micromachined probes
25(6)
References
28(3)
Introduction to silicon micromachining technology
31(16)
Lithography
31(4)
Thermal oxidation of silicon
35(2)
Metallization
37(1)
Silicon etching
38(2)
Silicon oxide etching
40(1)
Anodic bonding and packaging
41(6)
References
42(5)
Part 2: Experimental results and discussion
Fabrication of silicon microprobes for optical a near-field applications
47(26)
Overview of micromachined optical near-field probes
47(5)
Design of the probes
52(4)
Principles of the fabrication process
56(3)
Details of the fabrication process
59(2)
Fabrication results and discussion
61(12)
References
70(3)
Evaluation of microfabricated optical near-field probes
73(16)
Optical throughput measurement
73(3)
Measurement of spatial distribution of the near-field light
76(2)
Polarization behavior of the microfabricated aperture
78(4)
Static and dynamic properties of fabricated cantilevers
82(4)
Discussion
86(3)
References
87(2)
Novel probes for locally enhancing near-field light and other applications
89(32)
Fabrication of the coaxial apertured probes
89(3)
Fabrication of the apertured probe with a single carbon nanotube
92(4)
Fabrication of the apertured probe with an embedded Ag particle
96(4)
Fabrication and characterization of a hybrid structure of an optical fiber and apertured cantilever
100(10)
Fabrication and characterization of a metallic contact for thermal profiler and thermal recording probe array
110(4)
Initial results of the fabrication of electron field emission devices
114(2)
Discussion
116(5)
References
118(3)
Simulation using the finite difference time domain (FDTD) method
121(12)
Introduction
121(1)
FDTD modeling for optical near-field simulation
121(5)
Results of the FDTD simulation
126(7)
References
130(3)
Subwavelength optical imaging with fabricated probes
133(10)
Introduction
133(1)
Measurement setups
134(1)
Measurement results
135(2)
Discussion
137(6)
References
142(1)
Optical near-field lithography
143(10)
Introduction
143(1)
Fabrication of nanoscale apertures and slits
144(1)
Near-field optical pattern transfer
144(4)
Grid pattern transfer using polarized light
148(2)
Conclusion
150(3)
References
151(2)
Optical near-field recording with a fabricated aperture array
153(16)
Introduction
153(4)
The VCSEL/NSOM fabrication process
157(3)
Results of fabrication and first result of recording
160(4)
Discussion
164(5)
References
164(5)
Part 3: Conclusion
Future aspects and conclusions
169(4)
Outlook for the future
169(1)
Conclusions
170(3)
Index 173
Phan Ngoc Minh, Ono Takahito, Esashi Masayoshi