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1 | (6) |
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1 | (2) |
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3 | (4) |
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4 | (3) |
Part 1: Backgrounds |
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Introduction to near-field optics |
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7 | (24) |
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Far-field light and diffraction effect |
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7 | (5) |
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Concept of near-field optics and optical near-field microscopy |
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12 | (5) |
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Instrumentation of optical near-field imaging |
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17 | (2) |
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Techniques for control of the tip-sample distance |
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19 | (3) |
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Tapered optical fiber-based optical near-field probes |
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22 | (3) |
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Advantages of Si micromachined probes |
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25 | (6) |
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28 | (3) |
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Introduction to silicon micromachining technology |
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31 | (16) |
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31 | (4) |
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Thermal oxidation of silicon |
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35 | (2) |
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37 | (1) |
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38 | (2) |
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40 | (1) |
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Anodic bonding and packaging |
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41 | (6) |
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42 | (5) |
Part 2: Experimental results and discussion |
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Fabrication of silicon microprobes for optical a near-field applications |
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47 | (26) |
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Overview of micromachined optical near-field probes |
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47 | (5) |
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52 | (4) |
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Principles of the fabrication process |
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56 | (3) |
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Details of the fabrication process |
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59 | (2) |
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Fabrication results and discussion |
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61 | (12) |
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70 | (3) |
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Evaluation of microfabricated optical near-field probes |
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73 | (16) |
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Optical throughput measurement |
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73 | (3) |
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Measurement of spatial distribution of the near-field light |
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76 | (2) |
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Polarization behavior of the microfabricated aperture |
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78 | (4) |
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Static and dynamic properties of fabricated cantilevers |
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82 | (4) |
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86 | (3) |
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87 | (2) |
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Novel probes for locally enhancing near-field light and other applications |
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89 | (32) |
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Fabrication of the coaxial apertured probes |
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89 | (3) |
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Fabrication of the apertured probe with a single carbon nanotube |
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92 | (4) |
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Fabrication of the apertured probe with an embedded Ag particle |
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96 | (4) |
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Fabrication and characterization of a hybrid structure of an optical fiber and apertured cantilever |
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100 | (10) |
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Fabrication and characterization of a metallic contact for thermal profiler and thermal recording probe array |
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110 | (4) |
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Initial results of the fabrication of electron field emission devices |
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114 | (2) |
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116 | (5) |
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118 | (3) |
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Simulation using the finite difference time domain (FDTD) method |
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121 | (12) |
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121 | (1) |
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FDTD modeling for optical near-field simulation |
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121 | (5) |
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Results of the FDTD simulation |
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126 | (7) |
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130 | (3) |
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Subwavelength optical imaging with fabricated probes |
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133 | (10) |
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133 | (1) |
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134 | (1) |
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135 | (2) |
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137 | (6) |
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142 | (1) |
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Optical near-field lithography |
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143 | (10) |
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143 | (1) |
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Fabrication of nanoscale apertures and slits |
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144 | (1) |
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Near-field optical pattern transfer |
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144 | (4) |
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Grid pattern transfer using polarized light |
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148 | (2) |
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150 | (3) |
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151 | (2) |
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Optical near-field recording with a fabricated aperture array |
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153 | (16) |
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153 | (4) |
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The VCSEL/NSOM fabrication process |
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157 | (3) |
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Results of fabrication and first result of recording |
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160 | (4) |
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164 | (5) |
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164 | (5) |
Part 3: Conclusion |
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Future aspects and conclusions |
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169 | (4) |
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169 | (1) |
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170 | (3) |
Index |
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173 | |