This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
Preface
About the Authors
Chapter 1 Introduction to Nanoelectronics
Chapter 2 Tri-Gate FinFET Technology and Its Advancement
Chapter 3 Dual-k Spacer Device Architecture and Its Electrostatics
Chapter 4 Capacitive Analysis and Dual-k FinFET-Based Digital Circuit
Design
Chapter 5 Design Metric Improvement of a Dual-kBased SRAM Cell
Chapter 6 Statistical Variability and Sensitivity Analysis
INDEX
Sudeb Dasgupta, Brajesh Kumar Kaushik, Pankaj Kumar Pal
