Advances in Imaging and Electron Physics, Volume 201, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
- Contains contributions from leading authorities on microscopy
- Informs and updates on all the latest developments in the field of imaging and electron physics
- Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electron, and ion emission with a valuable resource
- Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing
Muu info
Contains cutting-edge articles on the latest developments in all areas of microscopy, image science and related subjects in electron physics
| Contributors |
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vii | |
| Preface |
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ix | |
| Future Contributions |
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xi | |
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1 Walsh--Hadamard Transforms: A Review |
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1 | (56) |
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2 | (2) |
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2 Definition of the Walsh Functions |
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4 | (9) |
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13 | (10) |
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23 | (11) |
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5 Frequency Domain Walsh Functions |
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34 | (7) |
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6 Complex Walsh-Hadamard Transforms |
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41 | (10) |
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51 | (6) |
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52 | (5) |
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2 Quantum Methodologies in Maxwell Optics |
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57 | (80) |
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58 | (5) |
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2 Traditional Prescriptions |
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63 | (2) |
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3 The Beam-Optical Formalism |
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65 | (9) |
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74 | (10) |
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84 | (8) |
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92 | (45) |
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95 | (1) |
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Appendix A Riemann--Silberstein Vector |
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95 | (2) |
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Appendix B Matrix Representation of Maxwell's Equations |
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97 | (8) |
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Appendix C Foldy--Wouthuysen Transformation |
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105 | (8) |
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Appendix D The Magnus Formula |
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113 | (3) |
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Appendix E Quantum Theory of Charged-Particle Beam Optics |
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116 | (5) |
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Appendix F Hamilton's Optical-Mechanical Analogy in the Wavelength-Dependent Regime |
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121 | (2) |
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123 | (14) |
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3 Information Measures, Mean Differences, and Inequalities |
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137 | (124) |
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138 | (6) |
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2 Inequalities Among Differences of Divergence Measures |
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144 | (19) |
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163 | (15) |
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4 Inequalities with Repeated Differences |
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178 | (11) |
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5 Parametric Generalized Measures |
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189 | (6) |
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195 | (60) |
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7 Connections with Divergence Measures |
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255 | (3) |
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258 | (3) |
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258 | (3) |
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4 Electron Microscopy at Very High Voltages |
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261 | (80) |
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262 | (3) |
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265 | (5) |
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3 The Penetrating Power of High Energy Electrons |
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270 | (12) |
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282 | (7) |
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5 Deterioration of the Object Under the Electron Beam |
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289 | (1) |
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6 Electron Diffraction and Microdiffraction at Very High Voltages |
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290 | (6) |
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7 Contrast in Electron Microscopy |
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296 | (9) |
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8 Very High Voltage Electron Microscopes |
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305 | (18) |
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9 Study of the Structure of Metals and Alloys |
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323 | (4) |
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10 The Observation of Living Material |
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327 | (7) |
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334 | (7) |
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336 | (1) |
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337 | (4) |
| Index |
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341 | |
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.
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