About the Author |
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xvii | |
Preface |
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xix | |
Acknowledgments |
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xxiii | |
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1 | (30) |
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1 | (15) |
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FA Techniques for Evaluation of ESD Events |
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2 | (1) |
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Fundamental Concepts of ESD FA Methods and Practices |
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3 | (1) |
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ESD Failure: Why Do Semiconductor Chips Fail? |
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4 | (1) |
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How to Use FA to Design ESD Robust Technologies |
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5 | (1) |
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How to Use FA to Design ESD Robust Circuits |
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6 | (1) |
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How to Use FA for Temperature Prediction |
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7 | (1) |
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How to Use Failure Models for Power Prediction |
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8 | (1) |
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FA Methods, Design Rules, and ESD Ground Rules |
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9 | (1) |
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FA and Semiconductor Process-Induced ESD Design Asymmetry |
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9 | (1) |
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FA Methodology and Electro-thermal Simulation |
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10 | (1) |
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FA and ESD Testing Methodology |
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10 | (3) |
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FA Methodology for Evaluation of ESD Parasitics |
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13 | (1) |
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FA Methods and ESD Device Operation Verification |
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14 | (1) |
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FA Methodology to Evaluate Inter-power Rail Electrical Connectivity |
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14 | (2) |
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How to Use FA to Eliminate Failure Mechanisms |
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16 | (1) |
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ESD Failure: How Do Micro-electronic Devices Fail? |
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16 | (4) |
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ESD Failure: How Do Metallurgical Junctions Fail? |
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18 | (1) |
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ESD Failure: How Do Insulators Fail? |
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18 | (1) |
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ESD Failure: How Do Metals Fail? |
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19 | (1) |
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Sensitivity of Semiconductor Components |
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20 | (4) |
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ESD Sensitivity as a Function of Materials |
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20 | (1) |
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ESD Sensitivity as a Function of Semiconductor Devices |
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21 | (1) |
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ESD Sensitivity as a Function of Product Type |
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21 | (1) |
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ESD and Technology Scaling |
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22 | (2) |
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24 | (1) |
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How Do Semiconductor Chips Fail---Are the Failures Random or Systematic? |
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24 | (2) |
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Closing Comments and Summary |
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26 | (1) |
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26 | (1) |
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27 | (4) |
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Failure Analysis Tools, Models, and Physics of Failure |
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31 | (46) |
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FA Techniques for Evaluation of ESD Events |
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31 | (3) |
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34 | (9) |
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34 | (1) |
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Scanning Electron Microscope |
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35 | (1) |
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Transmission Electron Microscope |
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35 | (1) |
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35 | (1) |
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Thermally Induced Voltage Alteration |
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36 | (1) |
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Superconducting Quantum Interference Device Microscope |
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37 | (1) |
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38 | (2) |
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40 | (1) |
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Picosecond Current Analysis Tool |
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40 | (2) |
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Transmission Line Pulse---Picosecond Current Analysis Tool |
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42 | (1) |
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ESD Simulation: ESD Pulse Models |
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43 | (11) |
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43 | (1) |
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44 | (1) |
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45 | (1) |
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46 | (1) |
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46 | (1) |
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47 | (2) |
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IEC System-Level Pulse Model |
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49 | (1) |
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50 | (1) |
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Transmission Line Pulse Testing |
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51 | (2) |
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Very Fast Transmission Line Pulse (VF-TLP) Model |
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53 | (1) |
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Ultra-fast Transmission Line Pulse (UF-TLP) Model |
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53 | (1) |
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Electro-Thermal Physical Models |
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54 | (14) |
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54 | (2) |
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56 | (4) |
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60 | (2) |
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62 | (1) |
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Arkihpov, Astvatsaturyan, Godovosyn, and Rudenko Model |
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63 | (1) |
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Dwyer, Franklin, and Campbell Model |
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63 | (4) |
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67 | (1) |
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Statistical Models for ESD Prediction |
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68 | (2) |
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Closing Comments and Summary |
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70 | (1) |
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70 | (1) |
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71 | (6) |
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77 | (48) |
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Tables of CMOS ESD Failure Mechanisms |
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77 | (1) |
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LOCOS Isolation-Defined CMOS |
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77 | (9) |
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82 | (1) |
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LOCOS-Bound P+/N-well Junction Diode |
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83 | (1) |
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LOCOS-Bound N+/P- Substrate Junction Diode |
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84 | (1) |
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LOCOS-Bound N-Well/P- Substrate Junction Diode |
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84 | (1) |
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LOCOS-Bound Lateral N-well to N-well |
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85 | (1) |
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LOCOS-Bound Lateral N+ to N-well |
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85 | (1) |
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LOCOS-Bound Lateral PNP Bipolar |
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85 | (1) |
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LOCOS-Bound Thick Oxide MOSFET |
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85 | (1) |
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Shallow Trench Isolation (STI) |
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86 | (4) |
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STI Pull-down ESD Failure Mechanism |
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86 | (1) |
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STI Pull-down and Gate Wrap-around |
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87 | (1) |
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88 | (1) |
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Non-silicide Diode Structures |
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88 | (1) |
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STI-Defined P+/N-well Diode |
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88 | (1) |
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STI-Defined N-well to Substrate Diode |
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88 | (2) |
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STI Lateral N-well to N-well NPN Structures |
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90 | (1) |
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Polysilicon-Defined Devices |
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90 | (2) |
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Polysilicon-Bound Gated Diode |
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91 | (1) |
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Lateral Diode with Block Mask |
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92 | (1) |
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92 | (7) |
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93 | (2) |
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N-channel Multi-finger MOSFETs |
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95 | (2) |
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Cascoded Series N-channel MOSFETs |
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97 | (1) |
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97 | (1) |
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P-channel Multi-finger MOSFETs |
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98 | (1) |
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Tungsten Silicide Gate MOSFET |
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98 | (1) |
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Polysilicon Silicide Gate MOSFET |
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98 | (1) |
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Metal Gate/High k Dielectric MOSFET |
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98 | (1) |
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99 | (3) |
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99 | (1) |
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99 | (2) |
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101 | (1) |
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Silicide Blocked N-diffusion Resistors |
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102 | (1) |
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Interconnects: Wires, Vias, and Contacts |
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102 | (10) |
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103 | (1) |
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104 | (3) |
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107 | (1) |
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107 | (3) |
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110 | (2) |
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ESD Failure in CMOS Nanostructures |
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112 | (6) |
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ESD Failures in 130 nm Technology |
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112 | (1) |
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ESD Failures in 90 nm Technology |
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113 | (1) |
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ESD Failures in 65 nm Technology |
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114 | (1) |
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ESD Failures in 45 nm Technology |
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115 | (1) |
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ESD Failures in 32 nm Technology |
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115 | (1) |
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ESD Failures in 22 nm Technology |
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116 | (2) |
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Closing Comments and Summary |
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118 | (1) |
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118 | (1) |
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119 | (6) |
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CMOS Circuits: Receivers and Off-Chip Drivers |
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125 | (34) |
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Table of CMOS Receiver and OCD ESD Failure Mechanisms |
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125 | (1) |
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125 | (2) |
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Receivers Circuits with ESD Networks |
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127 | (4) |
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Receiver with Dual Diode and Series Resistor |
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127 | (1) |
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Receiver with Diode-Resistor-Diode |
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128 | (1) |
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Receiver with Diode-Resistor-MOSFET |
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128 | (3) |
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Receiver Circuits with Half-Pass Transmission Gate |
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131 | (3) |
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Receiver with Full-Pass Transmission Gate |
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134 | (1) |
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Receiver with Full-Pass Transmission Gate with Second Power Source |
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135 | (1) |
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Receiver, Half-Pass Transmission Gate, and Keeper Network |
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135 | (4) |
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Receiver, Half-Pass Transmission Gate, and the Modified Keeper Network |
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138 | (1) |
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Receiver Circuits with Pseudo-Zero VT Half-Pass Transmission Gate |
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139 | (2) |
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Receiver with Zero VT Transmission Gate |
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141 | (2) |
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Receiver Circuits with Bleed Transistors |
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143 | (1) |
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Receiver Circuits with Test Functions |
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144 | (2) |
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Receiver with Schmitt Trigger Feedback Networks |
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146 | (2) |
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148 | (1) |
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OCD Design Process-Related ESD Failure |
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148 | (1) |
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Single NFET Pull-down OCD |
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149 | (1) |
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150 | (2) |
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I/O Design Considerations and ESD Parasitic Failure Mechanisms |
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152 | (3) |
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Layout-Dependent ESD Failure Mechanisms |
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153 | (2) |
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Closing Comments and Summary |
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155 | (1) |
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155 | (1) |
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156 | (3) |
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159 | (36) |
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Table of CMOS Integration ESD Failure Mechanisms |
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159 | (1) |
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Architcture and Design Synthesis-Related Failures |
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159 | (2) |
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161 | (1) |
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161 | (1) |
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161 | (1) |
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Intra- and Inter-domain ESD Protection |
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162 | (1) |
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Split Ground Configurations |
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162 | (1) |
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163 | (5) |
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Peripheral Vcc and Core VDD Power Rails |
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163 | (1) |
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Two Power Supply: Peripheral and Core VDD Power Rails |
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164 | (2) |
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166 | (2) |
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168 | (2) |
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168 | (1) |
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169 | (1) |
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Inter-domain Signal Line ESD Failures |
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170 | (3) |
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Digital-to-Analog Signal Line Failures |
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170 | (3) |
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173 | (1) |
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System Clock and Phase-Locked Loop |
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174 | (1) |
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174 | (4) |
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Fuse Networks and ESD Failure Mechanisms |
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174 | (2) |
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eFUSE and ESD Failure Mechanisms |
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176 | (2) |
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178 | (3) |
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178 | (1) |
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Floating Bond Pads over Interconnects |
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179 | (1) |
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Bond Pad Failure: Programmable VDD |
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180 | (1) |
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Bond Pad to Bond Pad ESD Failures |
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180 | (1) |
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Bond Pad Failure: ESD Structures under Bond Pads |
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181 | (1) |
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181 | (1) |
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MOSFET Floating Gate and Floating Gate Tie Down |
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181 | (1) |
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MOSFET Gates Connected to Power VDD |
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182 | (1) |
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182 | (1) |
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182 | (1) |
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183 | (1) |
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183 | (2) |
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Multi-chip systems on Multi-layer Ceramic |
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183 | (1) |
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Multi-chip Systems and Silicon Carriers |
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184 | (1) |
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Multi-chip Systems: Chip-to-Chip Failures with Adjacent Chips |
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184 | (1) |
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Multi-chip Systems: Proximity Communications |
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185 | (1) |
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185 | (3) |
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Table of Latchup Failures |
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185 | (2) |
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Latchup Failure Mechanisms |
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187 | (1) |
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Closing Comments and Summary |
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188 | (1) |
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189 | (2) |
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191 | (4) |
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SOI ESD Failure Mechanisms |
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195 | (30) |
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Tables of SOI Device and Integration ESD Failure Mechanisms |
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195 | (2) |
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197 | (2) |
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SOI Single-Finger N-channel MOSFETs |
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197 | (1) |
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198 | (1) |
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199 | (2) |
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SOI Poly-bound Gated Diode |
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199 | (1) |
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SOI Poly-bound Gated Diode with Halo Implants |
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199 | (2) |
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201 | (1) |
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SOI Failure Mechanisms in 150 nm Technology |
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202 | (2) |
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Lateral Graded Gated SOI Diode Structure |
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203 | (1) |
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Lateral Ungated SOI Diode Structure |
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203 | (1) |
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SOI ESD Failure Mechanisms in 45 nm Technology |
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204 | (2) |
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204 | (1) |
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SOI Double-Well Field Effect Device |
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204 | (1) |
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205 | (1) |
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SOI ESD Failure Mechanisms in 32 nm Technology |
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206 | (1) |
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SOI ESD Failure Mechanisms in 22 nm Technology and the Future |
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207 | (3) |
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SOI Design Synthesis and ESD Failure Mechanisms |
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210 | (7) |
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SOI ESD Circuit Failure Mechanisms |
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210 | (2) |
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Mixed Voltage SOI ESD Circuit Failure Mechanisms |
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212 | (2) |
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SOI Receiver Network ESD Failures |
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214 | (1) |
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215 | (1) |
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SOI Dynamic Threshold Circuitry |
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215 | (1) |
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SOI Active Clamp Circuitry |
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216 | (1) |
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SOI Integration: ESD Failure Mechanisms |
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217 | (1) |
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Closing Comments and Summary |
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218 | (1) |
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218 | (2) |
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220 | (5) |
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225 | (34) |
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Tables of RF CMOS ESD Failure Mechanisms |
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225 | (3) |
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228 | (1) |
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RF Shallow Trench Isolation Diode |
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229 | (2) |
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RF Polysilicon Gated Diode |
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231 | (1) |
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Silicon-Controlled Rectifier |
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232 | (1) |
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233 | (2) |
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235 | (6) |
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236 | (1) |
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Varactors and Hyper-abrupt Varactor Capacitors |
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237 | (1) |
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Metal-ILD-Metal Capacitor |
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237 | (1) |
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237 | (4) |
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241 | (1) |
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241 | (4) |
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241 | (1) |
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241 | (1) |
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Electronic Fuse (eFUSE) Resistor |
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241 | (4) |
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245 | (5) |
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245 | (3) |
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248 | (2) |
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Examples of RF ESD Circuit Failure Mechanisms |
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250 | (3) |
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Closing Comments and Summary |
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253 | (1) |
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253 | (1) |
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254 | (5) |
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Micro-electromechnical Systems |
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259 | (28) |
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Table of MEM Failure Mechanisms |
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260 | (1) |
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Electrostatically Actuated Devices |
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260 | (3) |
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263 | (2) |
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Torsional Ratcheting Actuator |
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265 | (2) |
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Electromagnetic Micro-power Generators |
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267 | (2) |
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269 | (1) |
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Electrostatically Actuated Variable Capacitor |
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270 | (1) |
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Micro-mechanical Switches |
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271 | (1) |
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271 | (6) |
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277 | (1) |
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Electrostatically Actuated Torsional Micro-mirrors |
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277 | (4) |
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Closing Comments and Summary |
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281 | (1) |
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281 | (1) |
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282 | (5) |
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287 | (28) |
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Tables of GaAs-Based ESD Failure Mechanisms |
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287 | (3) |
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290 | (1) |
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GaAs Energy-to-failure and Power-to-failure |
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290 | (3) |
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GaAs ESD Failures in Active and Passive Elements |
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293 | (1) |
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294 | (3) |
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GaAs HBT Device ESD Results |
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295 | (1) |
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296 | (1) |
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GaAs HBT-Based Passive Elements |
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297 | (1) |
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GaAs HBT Base-Collector Varactor |
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297 | (1) |
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298 | (2) |
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GaAs PHEMT Low Noise Amplifiers |
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299 | (1) |
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300 | (3) |
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GaAs PAs with Off-Chip Protection |
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303 | (1) |
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303 | (3) |
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InGaAs/AlGaAs PHEMT Devices |
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304 | (1) |
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InGaAs/AlGaAs PHEMT ESD Failure |
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305 | (1) |
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306 | (3) |
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GaN ESD Failure Mechanisms |
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307 | (2) |
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309 | (1) |
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Closing Comments and Summary |
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309 | (1) |
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309 | (1) |
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310 | (5) |
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Smart Power, LDMOS, and BCD Technology |
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315 | (18) |
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Tables of LDMOS ESD Failure Mechanisms |
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315 | (2) |
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LOCOS-Defined LDMOS Devices |
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317 | (2) |
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STI-Defined LDMOS Devices |
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319 | (1) |
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STI-Defined Isolated LDMOS Transistors |
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320 | (1) |
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LDMOS Transistors: ESD Electrical Measurements |
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321 | (1) |
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322 | (1) |
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LDMOS ESD Failure Mechanisms |
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323 | (1) |
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LDMOS Transistor Design Enhancement |
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324 | (1) |
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Latchup Events in LDMOS and BCD Technology |
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324 | (2) |
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Closing Comments and Summary |
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326 | (1) |
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327 | (1) |
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328 | (5) |
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333 | (28) |
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Tables of Magnetic Recording Failure Mechanisms |
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333 | (1) |
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334 | (9) |
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335 | (1) |
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336 | (1) |
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337 | (3) |
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AMR Head Failure Mechanisms |
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340 | (2) |
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ESD Protection of MR Head |
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342 | (1) |
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343 | (3) |
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343 | (1) |
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Inductive Head Structure: Electrical Schematic |
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344 | (1) |
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Inductive Head Structure: ESD Failures |
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345 | (1) |
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346 | (3) |
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346 | (1) |
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347 | (1) |
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347 | (2) |
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349 | (2) |
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349 | (1) |
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349 | (2) |
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TMR ESD Failure Mechanisms |
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351 | (1) |
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351 | (3) |
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351 | (1) |
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351 | (1) |
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Parasitic Magnetic Shields |
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352 | (1) |
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352 | (1) |
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Integration of a Silicon Chip |
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353 | (1) |
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Deposited Amorphous Silicon ESD Diodes |
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353 | (1) |
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353 | (1) |
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Closing Comments and Summary |
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354 | (1) |
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354 | (1) |
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355 | (6) |
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Photo-masks and Reticles: Failure Mechanisms |
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361 | (18) |
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Table of Photo-masks Failure Mechanisms |
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361 | (1) |
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Photo-mask Failure Mechanisms |
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361 | (3) |
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Photo-mask Inspection Tools |
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364 | (1) |
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Photo-mask ESD Characterization |
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365 | (1) |
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Electrical Breakdown versus Gap Spacing |
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365 | (2) |
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Electrical Breakdown in Air: The Townsend Model |
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367 | (1) |
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Electrical Breakdown in Air: Toepler's Spark Law |
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367 | (1) |
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Air Breakdown: The Paschen Breakdown Model |
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367 | (1) |
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Paschen Curve versus Reticle Breakdown Plot |
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368 | (1) |
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Electrical Model of Photo-mask Breakdown |
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369 | (2) |
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371 | (1) |
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ESD Damage for Single verus Multiple Events |
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372 | (1) |
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ESD Damage to Anti-reflective Coating |
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373 | (2) |
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ESD Solutions in Photo-masks |
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375 | (1) |
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Closing Comments and Summary |
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375 | (1) |
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|
375 | (1) |
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|
376 | (3) |
Index |
|
379 | |