This book deals with 3D nanodevices such as nanowire and nanosheet transistors at 7 nm and smaller technology nodes. The book focuses on how to set up 3D TCAD simulation tools, from mask layout to process and device simulation, including fabless intelligent manufacturing.
This book deals with 3D nanodevices such as nanowire and nanosheet transistors at 7 nm and smaller technology nodes. It discusses technology computer-aided design (TCAD) simulations of stress- and strain-engineered advanced semiconductor devices, including III-nitride and RF FDSOI CMOS, for flexible and stretchable electronics. The book focuses on how to set up 3D TCAD simulation tools, from mask layout to process and device simulation, including fabless intelligent manufacturing. The simulation examples chosen are from the most popular devices in use today and provide useful technology and device physics insights. In order to extend the role of TCAD in More-than-Moore era, the design issues related to strain engineering for flexible and stretchable electronics have been introduced for the first time.
1. Introduction
2. Fabless Intelligent Manufacturing
3. Simulation
Environment
4. Nanowire Transistors
5. Nanosheet Transistors
6. III-Nitride
Flexible Electronic Devices
7. FDSOI RF Flexible Electronics
8. Simulation at
Atomic Scale
Chinmay K. Maiti is a retired professor and former head of the department, Indian Institute of Technology Kharagpur, India, and currently a visiting professor at SOA University, Bhubaneswar, India. He is interested in strain-engineering in nanodevices, flexible/stretchable electronics, and nanoscale semiconductor device/process simulation research, and microelectronics education. Prof. Maiti has published several monographs on silicon-germanium, heterostructure-silicon, and technology computer-aided design and edited Selected Works of Professor Herbert Kroemer (2008).
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