Author Biographies |
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ix | |
Preface |
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xi | |
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Chapter 1 FinFET---From device concept to standard compact model |
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1 | (14) |
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1.1 The root cause of short-channel effects in the twenty-first century MOSFETs |
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2 | (2) |
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1.2 The thin-body MOSFET concept |
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4 | (1) |
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1.3 The FinFET and a new scaling path for MOSFETs |
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4 | (2) |
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6 | (1) |
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1.5 FinFET compact model---the bridge between FinFET technology and IC design |
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7 | (1) |
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1.6 A brief history of the first standard compact model, BSIM |
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8 | (1) |
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1.7 Core and real-device models |
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9 | (2) |
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1.8 The industry standard FinFET compact model |
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11 | (4) |
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12 | (3) |
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Chapter 2 Compact models for analog and RF applications |
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15 | (56) |
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15 | (1) |
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2.2 Important compact model metrics |
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16 | (1) |
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16 | (28) |
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2.3.1 Quiescent operating point |
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17 | (2) |
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2.3.2 Geometric scalability |
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19 | (4) |
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23 | (1) |
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2.3.4 Intrinsic voltage gain |
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24 | (7) |
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2.3.5 Speed: Unity gain frequency |
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31 | (1) |
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32 | (4) |
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2.3.7 Linearity and symmetry |
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36 | (6) |
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42 | (2) |
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44 | (24) |
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2.4.1 Two-port parameters |
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44 | (2) |
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46 | (9) |
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2.4.3 Non-quasi-static model |
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55 | (3) |
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58 | (6) |
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64 | (4) |
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68 | (3) |
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68 | (3) |
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Chapter 3 Core model for FinFETs |
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71 | (28) |
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3.1 Core model for double-gate FinFETs |
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72 | (8) |
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3.2 Unified FinFET compact model |
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80 | (19) |
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Chapter 3 Appendix: Explicit surface potential model |
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87 | (1) |
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3A.1 Continuous starting function |
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88 | (3) |
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3A.2 Quartic modified iteration: Implementation and evaluation |
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91 | (5) |
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96 | (3) |
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Chapter 4 Channel current and real device effects |
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99 | (28) |
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99 | (1) |
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4.2 Threshold voltage roll-off |
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100 | (6) |
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4.3 Subthreshold slope degradation |
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106 | (1) |
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4.4 Quantum mechanical vth correction |
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107 | (2) |
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4.5 Vertical-field mobility degradation |
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109 | (1) |
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4.6 Drain saturation voltage, vdsat |
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109 | (5) |
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4.6.1 Extrinsic case (RDSMOD = 1 and 2) |
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110 | (1) |
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4.6.2 Intrinsic case (RDSMOD = 0) |
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111 | (3) |
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4.7 Velocity saturation model |
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114 | (1) |
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4.8 Quantum mechanical effects |
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115 | (4) |
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4.8.1 Effective width model |
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118 | (1) |
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4.8.2 Effective oxide thickness/effective capacitance |
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118 | (1) |
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4.8.3 Charge centroid calculation for accumulation |
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119 | (1) |
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4.9 Lateral nonuniform doping model |
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119 | (1) |
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4.10 Body effect model for a bulk FinFET (BULKMOD = 1) |
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119 | (1) |
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4.11 Output resistance model |
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120 | (3) |
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4.11.1 Channel-length modulation |
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121 | (1) |
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4.11.2 Drain-induced barrier lowering |
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122 | (1) |
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123 | (4) |
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124 | (3) |
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Chapter 5 Leakage currents |
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127 | (16) |
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5.1 Weak-inversion current |
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129 | (1) |
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5.2 Gate-induced source and drain leakages |
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130 | (3) |
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5.2.1 GIDL/GISL current formulation in BSIM-CMG |
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132 | (1) |
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133 | (7) |
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5.3.1 Gate oxide tunneling formulation in BSIM-CMG |
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134 | (1) |
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5.3.2 Gate-to-body tunneling current in depletion/inversion |
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135 | (1) |
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5.3.3 Gate-to-body tunneling current in accumulation |
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136 | (1) |
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5.3.4 Gate-to-channel tunneling current in inversion |
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137 | (1) |
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5.3.5 Gate-to-source/drain tunneling current |
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138 | (2) |
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140 | (3) |
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141 | (2) |
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Chapter 6 Charge, capacitance, and non-quasi-static effects |
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143 | (14) |
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144 | (2) |
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144 | (1) |
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145 | (1) |
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146 | (1) |
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146 | (1) |
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6.3 Non-quasi-static effects models |
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147 | (10) |
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6.3.1 Relaxation time approximation model |
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149 | (2) |
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6.3.2 Channel-induced gate resistance model |
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151 | (1) |
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6.3.3 Charge segmentation model |
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152 | (3) |
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155 | (2) |
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Chapter 7 Parasitic resistances and capacitances |
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157 | (38) |
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7.1 FinFET device structure and symbol definitions |
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158 | (3) |
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7.2 Modeling of geometry-dependent source/drain resistances in FinFETs |
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161 | (8) |
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162 | (2) |
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7.2.2 Spreading resistance |
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164 | (3) |
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7.2.3 Extension resistance |
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167 | (2) |
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7.3 Parasitic resistance model verification |
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169 | (9) |
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7.3.1 TCAD simulation setup |
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169 | (1) |
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7.3.2 Device optimization |
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170 | (2) |
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7.3.3 Extraction of source and drain resistances |
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172 | (4) |
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176 | (2) |
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7.4 Implementation considerations of the parasitic resistance model |
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178 | (1) |
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7.4.1 Physical parameters |
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178 | (1) |
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7.4.2 Resistance components |
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178 | (1) |
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7.5 Gate electrode resistance model |
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179 | (1) |
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7.6 FinFET parasitic capacitance models |
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179 | (8) |
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7.6.1 Connection of parasitic capacitance components |
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179 | (2) |
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7.6.2 Derivation of two-dimensional fringe capacitance |
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181 | (6) |
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7.7 Modeling of FinFET fringe capacitance in three dimensions: CGEOMOD = 2 |
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187 | (1) |
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7.8 Parasitic capacitance model verification |
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188 | (4) |
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192 | (3) |
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193 | (2) |
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195 | (8) |
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195 | (1) |
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196 | (2) |
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198 | (3) |
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8.4 Other noise components |
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201 | (1) |
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201 | (2) |
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201 | (2) |
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Chapter 9 Junction diode I-V and C-V models |
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203 | (14) |
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9.1 Junction diode current model |
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205 | (5) |
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9.1.1 Reverse-bias additional leakage model |
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208 | (2) |
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9.2 Junction diode charge/capacitance model |
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210 | (7) |
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210 | (3) |
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213 | (3) |
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216 | (1) |
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Chapter 10 Benchmark tests for compact models |
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217 | (14) |
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10.1 Asymptotic correctness |
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218 | (1) |
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219 | (12) |
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10.2.1 Tests for checking physical behavior in weak-inversion and strong-inversion regions |
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219 | (3) |
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222 | (4) |
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10.2.3 Reciprocity test for capacitances in a compact model |
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226 | (1) |
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10.2.4 Test for the self-heating effect model |
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227 | (1) |
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10.2.5 Tests for the thermal noise model |
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227 | (1) |
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228 | (3) |
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Chapter 11 BSIM-CMG model parameter extraction |
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231 | (14) |
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11.1 Parameter extraction background |
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232 | (1) |
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11.2 BSIM-CMG parameter extraction strategy |
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233 | (9) |
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242 | (3) |
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242 | (3) |
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Chapter 12 Temperature dependence |
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245 | (16) |
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12.1 Semiconductor properties |
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246 | (1) |
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12.1.1 Band gap temperature dependence |
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246 | (1) |
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12.1.2 Temperature dependence of Nc, vbi, and Φb |
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246 | (1) |
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12.1.3 Temperature dependence of the intrinsic carrier concentration |
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247 | (1) |
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12.2 Temperature dependence of the threshold voltage |
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247 | (2) |
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12.2.1 Temperature dependence of drain-induced barrier lowering |
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248 | (1) |
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12.2.2 Temperature dependence of the body effect |
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248 | (1) |
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12.2.3 Subthreshold swing |
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248 | (1) |
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12.3 Temperature dependence of mobility |
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249 | (1) |
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12.4 Temperature dependence of velocity saturation |
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249 | (1) |
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12.4.1 Temperature dependence of the nonsaturation effect |
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250 | (1) |
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12.5 Temperature dependence of leakage currents |
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250 | (1) |
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250 | (1) |
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12.5.2 Gate-induced drain/source leakage |
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250 | (1) |
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251 | (1) |
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12.6 Temperature dependence of parasitic source/drain resistances |
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251 | (1) |
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12.7 Temperature dependence of source/drain diode characteristics |
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252 | (4) |
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12.7.1 Direct current model |
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252 | (2) |
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254 | (1) |
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12.7.3 Trap-assisted tunneling current |
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254 | (2) |
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256 | (1) |
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257 | (1) |
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12.10 Model validation on measured data |
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257 | (4) |
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260 | (1) |
Appendix |
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261 | (26) |
Index |
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287 | |