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1 | (18) |
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1 | (2) |
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1.2 Vapor Phase Thin Film Deposition Techniques |
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3 | (5) |
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1.2.1 Conformality of Vapor Phase Deposition Techniques |
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3 | (2) |
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1.2.2 Sticking Probability |
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5 | (1) |
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6 | (2) |
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1.3 Substrates and Scaffolds |
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8 | (4) |
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1.3.1 Deterministic Substrates |
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9 | (2) |
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1.3.2 Porous and Disordered Substrates |
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11 | (1) |
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12 | (4) |
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1.4.1 Conformality in Semiconductor Manufacturing |
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12 | (2) |
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1.4.2 Chemical Vapor Infiltration |
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14 | (1) |
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1.4.3 Chemical Engineering and Heterogeneous Catalysis |
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15 | (1) |
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16 | (3) |
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16 | (3) |
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2 Physical and Chemical Vapor Deposition Techniques |
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19 | (20) |
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2.1 Physical Vapor Deposition Methods: Evaporation and Sputtering |
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19 | (4) |
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20 | (1) |
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21 | (2) |
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2.1.3 Approaches to Improve Step Coverage in PVD Methods |
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23 | (1) |
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2.2 Chemical Vapor Deposition |
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23 | (7) |
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2.2.1 Impact of Kinetics on the Conformality of CVD Processes |
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24 | (5) |
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2.2.2 Strategies to Improve Conformality in CVD |
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29 | (1) |
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2.3 Atomic Layer Deposition |
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30 | (5) |
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30 | (1) |
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2.3.2 Models of ALD Surface Kinetics |
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31 | (3) |
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2.3.3 Application of ALD to High Surface Area Materials |
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34 | (1) |
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35 | (4) |
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36 | (3) |
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3 Fundamentals of Gas Phase Transport in Nanostructured Materials |
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39 | (30) |
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41 | (9) |
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3.1.1 Fundamental Equations |
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41 | (2) |
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3.1.2 Source Gas Distribution |
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43 | (1) |
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3.1.3 Particle Reemission Model |
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44 | (1) |
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45 | (5) |
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3.2 Single Particle Approaches to Ballistic Transport |
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50 | (6) |
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3.2.1 Kinetic Monte Carlo Simulations |
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51 | (2) |
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3.2.2 Markov Chain Formulation |
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53 | (3) |
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3.3 Continuum Description: Diffusion-Based Models |
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56 | (11) |
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3.3.1 Knudsen Diffusion Coefficient |
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57 | (4) |
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61 | (1) |
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3.3.3 Diffusion in Micropores |
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62 | (2) |
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3.3.4 Diffusion in Polymers |
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64 | (1) |
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3.3.5 Transport in Presence of Reversible Adsorption/Desorption |
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65 | (2) |
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67 | (2) |
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67 | (2) |
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4 Thin Film Growth in Nanostructured Materials |
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69 | (32) |
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4.1 PVD and Early Line of Sight Approximations |
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69 | (3) |
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70 | (1) |
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71 | (1) |
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4.2 Constant Sticking Probability |
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72 | (7) |
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4.2.1 Diffusion-Based Model |
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74 | (1) |
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4.2.2 Impact of Reaction Probability on Film Conformality |
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75 | (4) |
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4.3 Pressure-Dependent Kinetics |
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79 | (11) |
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4.3.1 Conformal Zone for Single-Source Precursors |
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81 | (4) |
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4.3.2 Superconformal Processes and Conformality Enhancement |
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85 | (5) |
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4.4 Self-limited Surface Kinetics: Atomic Layer Deposition |
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90 | (8) |
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4.4.1 Infiltration Kinetics |
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90 | (7) |
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4.4.2 Non-ideal ALD Processes |
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97 | (1) |
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98 | (3) |
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98 | (3) |
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101 | (26) |
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5.1 Predicting Shape Evolution |
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101 | (19) |
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102 | (1) |
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103 | (1) |
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103 | (3) |
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5.1.4 Method of Characteristics |
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106 | (8) |
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5.1.5 Cell or Volume of Fluid Methods |
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114 | (1) |
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115 | (4) |
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5.1.7 Pore Constriction Models |
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119 | (1) |
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5.2 Bridging Feature and Reactor Scales |
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120 | (4) |
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5.2.1 Effective Reactivity Approach |
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121 | (1) |
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5.2.2 Mesoscale Model Approach |
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122 | (2) |
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5.2.3 Effective Reaction Probability of High Surface Area Materials |
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124 | (1) |
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124 | (3) |
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125 | (2) |
Index |
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127 | |