Introduction and Overview |
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Rainer Behrisch and Wolfgang Eckstein |
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3 Distributions of Sputtered Particles |
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5 Sputtering Calculations |
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5.2 Computer Calculations |
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6 Sputtering Measurements |
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7 Applications of Sputtering |
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Computer Simulation of the Sputtering Process |
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Wolfgang Eckstein and Herbert M. Urbassek |
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1 Programs Based on the Binary Collision Approximation |
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1.2 The Interaction Potential for BCA |
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1.3 The Inelastic (Electronic) Energy Loss |
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1.4 The Surface Binding Energy |
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1.5 Problems of the Concept of BCA |
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1.6 Dynamic Monte Carlo Programs |
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1.7 Advantages of BCA Programs |
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2 Programs Based on Molecular Dynamics |
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2.1 Physics Input: Forces |
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2.1.1 Interatomic Potentials |
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2.2 Technical Considerations |
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2.2.2 Boundary Conditions |
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Sputtering Yields |
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3.1 Energy Dependence of the Sputtering Yield at Normal Incidence |
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3.3 Comparison of Calculated Values with Experimental Data |
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3.4 Angle of Incidence Dependence of the Sputtering Yield |
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3.5 Threshold Energy of Sputtering |
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4 Single Crystalline Materials |
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5.2 Oscillations in the Partial Sputtering Yields |
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5.3 Sputtering of Compounds |
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6 Temperature Dependence of the Sputtering Yield |
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8 Time Evolution of the Sputtering Yield |
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Results of Molecular Dynamics Calculations |
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2.1 Low-Energy Sputtering |
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2.2 Preferential Sputtering |
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4 Effect of Electronic Energy Loss and Electronic Excitations in Atomic Collision Cascades |
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5 High-Energy-Density (Spike) Phenomena |
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5.1 Sputtering from Fast-Ion-Induced Tracks |
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5.2.1 Small Cluster Impact (n less than or = to 3) 202 |
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5.2.2 Larger Cluster Impact (n > or = to 3) |
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5.2.3 Cluster-Induced Surface Smoothing |
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7 Surface Topography Formation |
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7.1 Surface Vacancy and Adatom Production |
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8 Effects of Surface Topography on Sputtering |
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8.1 Effect of Surface Steps on Sputtering |
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9 Fluence Dependence of Sputtering |
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10 Sputtering of Molecular and Organic Solids |
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10.1 Diatomic and Small Anorganic Molecular Solids |
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10.2 Sputtering of Organic Solids |
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10.3 Sputtering of Polymers |
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Energy and Angular Distributions of Sputtered Species |
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2.1 Energy Dissipation, Recoil Generation, and Sputtering |
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2.2 Surface Binding Energy |
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3 Experimental Techniques |
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3.1 Post-Ionization of Sputtered Neutrals |
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3.2 Methods for the Determination of Energy Spectra |
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3.2.1 Electrostatic Energy Analysis |
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3.2.2 Fluorescence Techniques |
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3.2.3 Time-of-Flight Measurements |
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3.3 Methods for Angular Distribution Measurement, |
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4 Energy and Angular Distributions in the Linear-Cascade Regime |
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4.1 Energy Spectra from Metals, Semiconductors, and Organic Materials |
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4.1.1 Energy Spectra of Ground- and Excited-State Atoms, and of Ions |
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4.1.2 Energy Distributions of Atoms Sputtered from Alloys |
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4.1.3 Energy Spectra of Sputtered Molecules |
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4.2 Energy Spectra from Alkali Halides and Condensed Gases |
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4.2.1 Alkali Halides and Related Materials |
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4.3 Angular Distribution of Sputtered Species |
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4.3.1 Angular Distributions from Amorphous and Polycrystalline Targets |
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4.3.2 Angular Spectra from Single Crystals |
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4.3.3 Angular Distributions from Multicomponent Targets |
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5 Energy and Angular Distributions in the Single-Knockon Regime |
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5.1 Energy Spectra and Direct Recoils |
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5.1.1 Normal Incidence Bombardment |
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5.1.2 Oblique Incidence Bombardment |
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5.2 Angular Distributions at Low-Energy Irradiation |
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6 Energy and Angular Spectra from High-Density Cascades |
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6.1 Cluster-Ion Bombardment |
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6.2 Yield Enhancement under Cluster Impact |
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6.3 Energy Distributions under Cluster Bombardment |
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6.4 Angular Distributions under Cluster Irradiation |
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Chemical Sputtering |
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Wolfgang Jacob and Joachim Roth |
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2 Chemical Effects in Sputtering |
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4.4 Optical Emission Spectroscopy |
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4.6 Dedicated Multiple Beam Experiments |
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5 Chemical Erosion of Carbon by Atomic Hydrogen |
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5.2 Species Released by Chemical Erosion |
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6.1 Chemical Sputtering with Reactive Ions |
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6.1.1 Temperature Dependence |
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6.1.3 Dependence on the Type of Graphite |
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6.1.5 Identification of Species Released by Chemical Sputtering |
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6.2 Combined Irradiation with Noble Gas Ions and Hydrogen Atoms |
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6.4 Chemical Sputtering with Molecular Ions at Low Energies |
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6.5 Summary of Experimental Results |
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7 Mechanisms and Modelling for Chemical Sputtering |
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7.1 Empirical Analytic Description |
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7.1.2 Low-temperature Near-surface Process, Y surf |
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7.1.3 Empirical Roth–Garcia-Rosales Formula |
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7.1.4 Comparison with Erosion Data |
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7.1.5 Extrapolation to Thermal Energies |
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7.2 Chemical Sputtering Model by Hopf |
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7.3 Molecular Dynamics Simulations |
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7.5 Effects due to Out-diffusion of Hydrocarbons |
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8 Chemical Sputtering with Other Reactive Species |
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Electronic Sputtering with Swift Heavy Ions |
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Walter Assmann, Marcel Toulemonde, and Christina Trautmann |
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2.1 Special Problems in High-Energy Sputtering |
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2.2 Measuring Techniques for Sputtering Yields |
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2.3 Angular Distribution, Total Yield, and Fluence Effect |
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2.4 Experimental Arrangements |
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3.1 Dependence of Sputtering Yield on Charge State of Incoming Ions |
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416 | |
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3.2 Dependence of Sputtering Yield on Angle of Beam Incidence |
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3.3.1 Angular Distribution of Sputtered Particles for Metallic Targets |
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3.3.2 Total Sputtering Yields for Metallic Targets |
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418 | |
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3.4.1 Angular Distributions of Sputtered Particles for Oxides |
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421 | |
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3.4.2 Total Sputtering Yields for Oxides |
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422 | |
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3.5.1 Angular Distributions of Sputtered Particles for Ionic Crystals |
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3.5.2 Total Sputtering Yields for Ionic Crystals |
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3.6 Summary of Experimental Sputtering Data of Different Materials |
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4 Calculations Based on the Inelastic Thermal Spike Model |
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4.1 Application to Metals |
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4.2 Application to Insulators |
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4.3 Thermal Spike Conclusion |
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5 Concluding Remarks and Outlook |
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Author Index |
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