| Preface |
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xi | |
| Acknowledgements |
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xv | |
| 1 The World of MEMS |
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1 | (12) |
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1 | (12) |
| 2 Basic Fabrication Processes |
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13 | (18) |
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13 | (2) |
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2.2 Lithography, Masks and Reticles |
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15 | (4) |
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2.3 Deposition and Etching |
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19 | (1) |
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2.4 The Sacrificial Layer |
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20 | (3) |
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2.5 Number of Dies per Wafer |
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23 | (6) |
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29 | (2) |
| 3 Surface Micromachining |
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31 | (42) |
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31 | (1) |
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32 | (4) |
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3.3 Optical Wafer Stepper |
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36 | (5) |
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3.4 Low-Pressure Chemical Vapour Deposition |
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41 | (3) |
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3.5 Plasma-Enhanced Chemical Vapour Deposition |
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44 | (2) |
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46 | (5) |
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3.7 DC and RF Sputter Deposition |
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51 | (3) |
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54 | (3) |
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57 | (4) |
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3.10 Chemical Mechanical Polishing |
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61 | (2) |
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3.11 Electron-Beam Pattern Generation |
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63 | (6) |
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3.12 Surface Microengineering Equipment Summary |
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69 | (4) |
| 4 High-Aspect-Ratio Micromachining |
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73 | (42) |
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73 | (4) |
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4.2 Deep Reactive-Ion Etching |
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77 | (5) |
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4.3 Excimer Laser Ablation |
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82 | (3) |
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85 | (6) |
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91 | (3) |
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94 | (3) |
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97 | (3) |
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100 | (4) |
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4.9 Critical-Point-Drying |
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104 | (3) |
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107 | (2) |
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4.11 High-Aspect-Ratio Equipment Summary |
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109 | (6) |
| 5 MEMS Testing |
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115 | (10) |
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115 | (1) |
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5.2 Testing of Semiconductors |
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116 | (4) |
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120 | (5) |
| 6 MEMS Packaging |
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125 | (22) |
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125 | (2) |
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127 | (4) |
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131 | (3) |
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134 | (2) |
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136 | (4) |
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140 | (1) |
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6.7 Single- and Multi-Die Packaging |
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141 | (2) |
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6.8 MEMS Packaging Summary |
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143 | (4) |
| 7 Clean Rooms, Buildings and Plant |
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147 | (18) |
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147 | (3) |
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7.2 Clean Rooms and Buildings for Integrated Circuits |
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150 | (6) |
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7.3 Clean Rooms and Buildings for a MEMS Foundry |
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156 | (9) |
| 8 The MEMSCOST Spreadsheet |
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165 | (32) |
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165 | (1) |
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8.2 Basic Structure of the MEMSCOST Spreadsheet |
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166 | (1) |
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167 | (3) |
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170 | (3) |
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8.5 Fabrication Machine Simulators |
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173 | (1) |
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8.6 Test and Packaging Machine Simulators |
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174 | (5) |
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8.7 CMOS/BiCMOS Simulation |
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179 | (7) |
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186 | (1) |
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8.9 Wafer and Die Calculations |
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187 | (1) |
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188 | (2) |
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190 | (7) |
| 9 Product Costs: Accelerometers |
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197 | (28) |
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197 | (8) |
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9.2 Costs for Die Fabrication |
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205 | (4) |
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209 | (6) |
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9.4 Cost Comparison for Testing Regimes |
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215 | (3) |
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9.5 Cost Comparison between Single- and Multi-Die Assemblies |
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218 | (3) |
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9.6 Sensitivity of Costs to Manufacturing Parameters |
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221 | (4) |
| 10 Product Costs: Microphones |
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225 | (22) |
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225 | (6) |
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10.2 Costs for Die Fabrication |
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231 | (4) |
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235 | (5) |
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10.4 Cost Comparisons for Testing Regimes |
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240 | (1) |
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10.5 Cost Comparison between Single- and Multi-Die Assembly |
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241 | (2) |
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10.6 Sensitivity to Manufacturing Costs |
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243 | (4) |
| 11 MEMS Foundries |
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247 | (16) |
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247 | (1) |
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248 | (1) |
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11.3 Multi-Product Use of Processes and Equipment |
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249 | (1) |
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11.4 MEMS Foundry Lightly Loaded |
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250 | (2) |
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11.5 Multi-Project Wafers |
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252 | (11) |
| 12 Financial Reporting and Analysis |
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263 | (14) |
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263 | (1) |
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12.2 Key Financial Statements |
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263 | (1) |
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264 | (1) |
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12.3.1 Product Specification |
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265 | (1) |
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265 | (1) |
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12.3.3 Capital Investment |
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266 | (1) |
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266 | (1) |
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267 | (2) |
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269 | (2) |
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271 | (2) |
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12.5 Profit, Profit Margin and Markup |
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273 | (1) |
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12.6 Total Cost of Ownership |
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273 | (1) |
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12.7 Return on Investment |
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274 | (1) |
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275 | (2) |
| 13 Conclusions |
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277 | (6) |
| Index |
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283 | |